SCHEMBL6895130

SCHEMBL6895130

O=C1OC(=O)C12C(F)=C(F)C(F)(F)C(F)(F)C2(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9770544 0.72
SCHEMBL332651 0.71
SCHEMBL1483933 0.68 MEN1 (0.33)
SCHEMBL1481548 0.68 MEN1 (0.33)
SCHEMBL1483936 0.68 MEN1 (0.33)
SCHEMBL316973 0.66
SCHEMBL318323 0.65 TP53 (0.31)
SCHEMBL274532 0.64
SCHEMBL9755516 0.64
SCHEMBL18179610 0.59 TP53 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6835528-B2 Has high transparency at a wavelength of 157 nm and which therefore permits a greater layer thickness in photolithography for the production of microchips INFINEON TECHNOLOGIES AG (DE) 2004-12-28 US disclosed
US-20030157432-A1 Fluorine-containing photoresist having reactive anchors for chemical amplification and improved copolymerization properties POLARIS INNOVATIONS LIMITED (IE) 2003-08-21 US disclosed