Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.64 |
| ▸ | MMP2 | P08253 | 1/20 | 0.59 |
| ▸ | IDO1 | P14902 | 1/20 | 0.52 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.50 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.50 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.50 |
| ▸ | G6PD | P11413 | 1/20 | 0.48 |
| ▸ | CASP7 | P55210 | 1/20 | 0.48 |
| ▸ | CASP6 | P55212 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | CDC25B | P30305 | 2/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.44 |
| ▸ | JAK2 | O60674 | 1/20 | 0.44 |
| ▸ | RPS6KA3 | P51812 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29549299 | 1.00 | HSD17B10 (0.64) | HSD17B10MMP2IDO1NR4A1NR4A2 | |
| SCHEMBL28977137 | 0.98 | HSD17B10 (0.62) | HSD17B10MMP2IDO1NR4A1NR4A2 | |
| Nitrogen SCHEMBL28623623 | 0.96 | HSD17B10 (0.60) | HSD17B10MMP2IDO1NR4A1NR4A2 | |
| SCHEMBL29404347 | 0.84 | HSD17B10 (0.78) | HSD17B10MMP2NR4A1NR4A2NR4A3 | |
| Benzene SCHEMBL28110156 | 0.84 | HSD17B10 (0.78) | HSD17B10MMP2NR4A1NR4A2NR4A3 | |
| SCHEMBL68291 | 0.84 | HSD17B10 (0.78) | HSD17B10MMP2NR4A1NR4A2NR4A3 | |
| SCHEMBL7624693 | 0.84 | HSD17B10 (0.78) | HSD17B10MMP2NR4A1NR4A2NR4A3 | |
| SCHEMBL29202009 | 0.84 | NR4A1 (0.49) | HSD17B10MMP2IDO1NR4A1NR4A2 | |
| SCHEMBL28835939 | 0.83 | NR4A1 (0.61) | HSD17B10MMP2IDO1NR4A1NR4A2 | |
| SCHEMBL6782374 | 0.83 | KDM4E (0.48) | HSD17B10MMP2ALDH1A1KDM4ETSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 296 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114989475-B | Preparation method and product application of biological functionalized surface modified polyether-ether-ketone material | 浙江大学 | 2023-07-18 | — | — | CN | claimed |
| CN-114989475-A | Preparation method and product application of bio-functionalized surface modified polyether-ether-ketone material | 浙江大学 | 2022-09-02 | — | — | CN | claimed |
| CN-114522245-A | Targeted telomerase nano-drug delivery system and preparation method and application thereof | 宿州学院 | 2022-05-24 | — | — | CN | claimed |
| EP-1630605-B1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2017-10-11 | — | — | EP | claimed |
| CN-101768265-A | Modified nylon and preparation method thereof | UNIV SUZHOU | 2010-07-07 | — | — | CN | claimed |
| CN-1308135-A | Intracellular gene analysis method | CHENGDU GUOJIA PHARMACEUTICAL (CN) | 2001-08-15 | — | — | CN | claimed |
| US-4824962-A | Process for the preparation of naphthostyril | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-04-25 | — | — | US | claimed |
| EP-0217279-A1 | Process for the manufacture of naphthostyrile | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-04-08 | — | — | EP | claimed |
| US-4152330-A | FROM 1-NAPHTHYL ISOCYANATE AND ANHYDROUS ALUMINUM HALIDE IN HOMOGENEOUS SOLUTION | BAYER AKTIENGESELLSCHAFT (DE) | 1979-05-01 | — | — | US | claimed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4660704-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250355350-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-4650874-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-19 | — | — | EP | disclosed |
| EP-0217279-A1 | Process for the manufacture of naphthostyrile | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-04-08 | — | — | EP | disclosed |
| US-4152330-A | FROM 1-NAPHTHYL ISOCYANATE AND ANHYDROUS ALUMINUM HALIDE IN HOMOGENEOUS SOLUTION | BAYER AKTIENGESELLSCHAFT (DE) | 1979-05-01 | — | — | US | disclosed |
| US-4022799-A | DYEING, PRINTING OF NATURAL AND SYNTHETIC MATERIALS | BAYER AKTIENGESELLSCHAFT (DT) | 1977-05-10 | — | — | US | disclosed |
| US-4012365-A | TRANSPARENCY, ALCOHOL RESISTANCE | TEIJIN LIMITED (JA) | 1977-03-15 | — | — | US | disclosed |
| US-4001253-A | NAPHTHOLACTAM DYESTUFFS | BAYER AKTIENGESELLSCHAFT (DT) | 1977-01-04 | — | — | US | disclosed |
| US-3950347-A | NAPHTHOLACTAM DYESTUFFS | BAYER AKTIENGESELLSCHAFT (DT) | 1976-04-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | HSD17B10 4284/4885MMP2 4304/4885IDO1 3063/4885 |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | PRDM9, ARCN1, PUF60 | HSD17B10 4119/4885MMP2 1702/4885IDO1 2952/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.