SCHEMBL690461

SCHEMBL690461

CC=CC(=O)OC(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL690460 1.00
SCHEMBL13282549 1.00
Methylamine SCHEMBL11681486 0.95 HCAR2 (0.58)
SCHEMBL178194 0.86 HCAR2 (0.80)
SCHEMBL177748 0.86 HCAR2 (0.80)
SCHEMBL177747 0.86 HCAR2 (0.80)
SCHEMBL1173409 0.83 HCAR2 (0.56)
SCHEMBL1173410 0.83 HCAR2 (0.56)
SCHEMBL4866847 0.82
SCHEMBL22092240 0.82 HCAR2 (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 169 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119842003-A Acrylic ester polymer 日东电工(上海松江)有限公司 2025-04-18 CN claimed
CN-119842331-A Adhesive composite sheet 日东电工(上海松江)有限公司 2025-04-18 CN claimed
CN-118812769-A Janus structure polymer epidermis patch electrode induced by picrylide and preparation method thereof 江苏师范大学 2024-10-22 CN claimed
CN-110387035-B Demulsifier, preparation method thereof and application thereof in demulsification of thick oil containing asphaltene 中国石油化工股份有限公司 2022-01-04 CN claimed
CN-108117472-B Method for preparing benzene ring-containing compound from pinacol 中国科学院大连化学物理研究所 2020-08-11 CN claimed
EP-3088955-B1 RESIST COMPOSITION AND PATTERNING PROCESS SHINETSU CHEMICAL CO (JP) 2020-06-03 EP claimed
CN-106094450-B Resist composition and patterning method 信越化学工业株式会社 2020-05-05 CN claimed
US-9927708-B2 Pattern forming process and shrink agent SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-27 US claimed
US-9921479-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-20 US claimed
US-9904172-B2 Shrink material and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-02-27 US claimed
US-20160124312-A1 PATTERN FORMING PROCESS AND SHRINK AGENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-05-05 US claimed
US-20160124313-A1 PATTERN FORMING PROCESS AND SHRINK AGENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-05-05 US claimed
US-20150338744-A1 PATTERN FORMING PROCESS AND SHRINK AGENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-26 US claimed
US-9052603-B2 Pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-09 US claimed
US-20150086929-A1 PATTERN FORMING PROCESS AND SHRINK AGENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-03-26 US claimed
US-20140234785-A1 PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-21 US claimed
US-6750291-B2 POLYURETHANE AND 1*50% BY WEIGHT ADDITION POLYMERIZATION POLYMER HAVING FUNCTIONAL GROUP OF CARBOXYLIC ACID DERIVATIVE; TRANSDERMAL DRUG DELIVERY PACIFIC CORPORATION (KR) 2004-06-15 US claimed
US-20030199644-A1 Film-forming agent for drug delivery and preparation for percutaneous administration containing the same PACIFIC CORPORATION (KR) 2003-10-23 US claimed
WO-2002036700-A1 CURABLE POWDER COATING COMPRISING COPOLYMERS OF AT LEAST ALKYLESTERS AND AN EPOXY ALKYLESTER RESOLUTION RESEARCH NEDERLAND B.V. (NL) 2002-05-10 WO claimed
US-5209847-A ULTRATHIN MEMBRANE OF POLYMETHACRYLATE OR POLYCROTONATE AND DEVICE PROVIDED WITH ULTRATHIN MEMBRANE NIPPON OIL AND FATS CO., LTD. (JP) 1993-05-11 US claimed