SCHEMBL6907699

SCHEMBL6907699

C=C(I)C(=O)[O-].[Tl+]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6913231 0.92 CA4 (0.40)
SCHEMBL6914529 0.92 CA4 (0.40)
SCHEMBL6916963 0.92 CA4 (0.40)
SCHEMBL6918634 0.92 CA4 (0.40)
Zinc Ion SCHEMBL6916965 0.92 CA4 (0.40)
SCHEMBL6918290 0.92 CA4 (0.40)
SCHEMBL6915006 0.69
Methacrylic Acid SCHEMBL6909477 0.69
SCHEMBL6909420 0.69
SCHEMBL6907811 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6830704-B2 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. (JP) 2004-12-14 US disclosed
US-20030135016-A1 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. 2003-07-17 US disclosed
US-6547985-B1 Adhesive mixture TOGOSEI CO., LTD. (JP) 2003-04-15 US disclosed