SCHEMBL6909964

SCHEMBL6909964

CCC1(CC)OCCCO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL733500 0.94
SCHEMBL1018739 0.87
SCHEMBL12022245 0.84
SCHEMBL7514356 0.84
SCHEMBL714207 0.84 KDM4E (0.34)
SCHEMBL14778544 0.80
SCHEMBL14778897 0.80
SCHEMBL14779214 0.78
SCHEMBL14778491 0.78
SCHEMBL10309205 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110073537-B Nonaqueous electrolyte solution and electricity storage device using same MU电解液株式会社 2022-08-23 CN claimed
US-12230796-B2 Secondary battery MURATA MANUFACTURING CO., LTD. (JP) 2025-02-18 US disclosed
CN-114450820-B Secondary battery 株式会社村田制作所 2024-05-28 CN disclosed
CN-110073537-B Nonaqueous electrolyte solution and electricity storage device using same MU电解液株式会社 2022-08-23 CN disclosed
US-20220216472-A1 SECONDARY BATTERY MURATA MANUFACTURING CO., LTD. (JP) 2022-07-07 US disclosed
CN-114450820-A Secondary battery 株式会社村田制作所 2022-05-06 CN disclosed
US-20210226253-A1 ELECTROLYTIC SOLUTION FOR LITHIUM-ION SECONDARY BATTERY, AND LITHIUM-ION SECONDARY BATTERY MURATA MANUFACTURING CO., LTD. (JP) 2021-07-22 US disclosed
EP-2735581-B1 COMPOSITION AND POLYMER ASAHI CHEMICAL IND (JP) 2021-07-14 EP disclosed
US-20200387069-A1 SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-12-10 US disclosed
CN-105754099-B Composition and polymer 旭化成株式会社 2018-09-18 CN disclosed
US-20140371468-A1 Process for the Preparation of 1-H-pyrrolidine-2,4-dione Derivatives BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) 2014-12-18 US disclosed
EP-2735581-A1 COMPOSITION AND POLYMER Asahi Kasei Chemicals Corporation (JP) 2014-05-28 EP disclosed
US-20140121293-A1 Composition and Polymer ASAHI KASEI CHEMICALS CORPORATION (JP) 2014-05-01 US disclosed
US-20130072648-A1 SOLID CATALYST FOR OLEFIN POLYMERIZATION AND PROCESS FOR PRODUCING OLEFIN POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-03-21 US disclosed
US-20130060024-A1 Compounds useful for treating neurodegenerative disorders SATORI PHARMACEUTICALS, INC. (US) 2013-03-07 US disclosed
US-7279601-B2 Optically active α-aminooxyketone derivatives and process for production thereof TOKYO UNIVERSITY OF SCIENCE, CENTER FOR SCIENCE AND TECHNOLOGY EXCHANGE (JP) 2007-10-09 US disclosed
US-7279601-B2 Optically active α-aminooxyketone derivatives and process for production thereof TOKYO UNIVERSITY OF SCIENCE, CENTER FOR SCIENCE AND TECHNOLOGY EXCHANGE (JP) 2007-10-09 US disclosed
US-6753127-B2 USING MIXTURE OF NORBORNENE POLYMER, ACID GENERATOR AND SOLVENT; PREBAKING, EXPOSURE TO RADIATION SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-06-22 US disclosed
US-20030118933-A1 Norbornene-based copolymer for photoresist, preparation method thereof, and photoresist composition comprising the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2003-06-26 US disclosed
US-4104247-A PROPYLENE HOMO- OR COPOLYMERS ALUMINIC ESTERS MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1978-08-01 US disclosed