SCHEMBL6913993

SCHEMBL6913993

CC(=C(C(F)(C(F)(F)F)C(F)(F)F)C(F)(C(F)(F)F)C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15277847 0.91
SCHEMBL15489545 0.86
SCHEMBL6913998 0.84
SCHEMBL6915901 0.84
SCHEMBL16477648 0.84
SCHEMBL8400571 0.79
SCHEMBL15277849 0.78
SCHEMBL25491933 0.76
SCHEMBL333765 0.76
SCHEMBL13065839 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230265346-A1 LIQUID CRYSTAL COMPOSITION, OPTICALLY ANISOTROPIC LAYER, LAMINATE, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-08-24 US disclosed
US-20230143665-A1 FLUORINE-CONTAINING POLYMER, COMPOSITION, OPTICAL FILM, LIQUID CRYSTAL FILM, HARDCOAT FILM, AND POLARIZING PLATE FUJIFILM CORPORATION (JP) 2023-05-11 US disclosed
US-11186669-B2 Polymerizable composition and optically anisotropic body using same DIC CORPORATION (JP) 2021-11-30 US disclosed
US-11009627-B2 Antireflective optical member and method for producing antireflective optical member CANON KABUSHIKI KAISHA (JP) 2021-05-18 US disclosed
EP-3604464-A1 SURFACE TREATMENT AGENT AND METHOD FOR PRODUCING SAME Neos Co., Ltd. (JP) 2020-02-05 EP disclosed
WO-2019188572-A1 ELECTROLYTE MEMBRANE 東レ株式会社 2019-10-03 WO disclosed
US-20190233565-A1 POLYMERIZABLE COMPOSITION AND OPTICALLY ANISOTROPIC BODY USING SAME DIC CORPORATION (JP) 2019-08-01 US disclosed
US-20170104161-A1 CHARGE-TRANSPORTING VARNISH NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-04-13 US disclosed
US-20160375652-A1 STACK, METHOD FOR TREATING SUBSTRATE MATERIAL, TEMPORARY FIXING COMPOSITION, AND SEMICONDUCTOR DEVICE JSR CORPORATION (JP) 2016-12-29 US disclosed
US-8889557-B2 Substrate treating method, temporary fixing composition and semiconductor device JSR CORPORATION (JP) 2014-11-18 US disclosed
US-20130285217-A1 SUBSTRATE TREATING METHOD, TEMPORARY FIXING COMPOSITION AND SEMICONDUCTOR DEVICE JSR CORPORATION (JP) 2013-10-31 US disclosed
US-20080057448-A1 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-03-06 US disclosed
US-20080050683-A1 Photothermographic material FUJIFILM CORPORATION (JP) 2008-02-28 US disclosed
US-6689923-B2 STARTING MATERIAL FOR PRODUCING A PERFLUOROALKYL RADICAL NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2004-02-10 US disclosed
US-20030171628-A1 Perfluoroolefin-hydrocarbon hybrid compound, method of producing the same and method of producing perfluoroalkyl radical NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY 2003-09-11 US disclosed