SCHEMBL6914595

SCHEMBL6914595

CC(F)(C(=C(C(F)(F)F)C(F)(F)F)C(F)(C(F)(F)F)C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18737155 0.88
SCHEMBL16477648 0.79
SCHEMBL16477668 0.79
SCHEMBL6359296 0.78
SCHEMBL28290163 0.78
SCHEMBL25494577 0.74
SCHEMBL25491928 0.74
SCHEMBL15275128 0.72
SCHEMBL25491933 0.72
SCHEMBL18737156 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230265346-A1 LIQUID CRYSTAL COMPOSITION, OPTICALLY ANISOTROPIC LAYER, LAMINATE, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-08-24 US disclosed
WO-2020040249-A1 HEAT-RESISTANT RELEASE AGENT COMPOSITION 株式会社ネオス 2020-02-27 WO disclosed
EP-3604464-A1 SURFACE TREATMENT AGENT AND METHOD FOR PRODUCING SAME Neos Co., Ltd. (JP) 2020-02-05 EP disclosed
US-6689923-B2 STARTING MATERIAL FOR PRODUCING A PERFLUOROALKYL RADICAL NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2004-02-10 US disclosed
US-20030171628-A1 Perfluoroolefin-hydrocarbon hybrid compound, method of producing the same and method of producing perfluoroalkyl radical NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY 2003-09-11 US disclosed