SCHEMBL6915323

SCHEMBL6915323

O=C(O)c1cccc2c(Br)cccc12.[Hg]

nearest known ligand 0.73

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PRNP P04156 1/20 0.73
KMT2A Q03164 8/20 0.59
MEN1 O00255 7/20 0.59
NR4A1 P22736 1/20 0.55
NR4A2 P43354 1/20 0.55
NR4A3 Q92570 1/20 0.55
AHR P35869 1/20 0.46
ALDH1A1 P00352 2/20 0.46
ALOX15 P16050 1/20 0.46
CDC25B P30305 1/20 0.44
FABP4 P15090 1/20 0.44
PTPN1 P18031 1/20 0.43
RXFP1 Q9HBX9 1/20 0.42
KDM4E B2RXH2 1/20 0.41
CYP2C9 P11712 1/20 0.41
HPGD P15428 1/20 0.41
TSHR P16473 1/20 0.41
ALOX12 P18054 1/20 0.41
ATIC P31939 1/20 0.41
HSD17B10 Q99714 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL148106 0.98 PRNP (0.76) PRNPKMT2AMEN1NR4A1NR4A2
SCHEMBL6916189 0.96 PRNP (0.73) PRNPKMT2AMEN1NR4A1NR4A2
SCHEMBL6913857 0.96 PRNP (0.73) PRNPKMT2AMEN1NR4A1NR4A2
SCHEMBL6915637 0.96 PRNP (0.73) PRNPKMT2AMEN1NR4A1NR4A2
SCHEMBL6913620 0.96 PRNP (0.73) PRNPKMT2AMEN1NR4A1NR4A2
SCHEMBL6913244 0.96 PRNP (0.73) PRNPKMT2AMEN1NR4A1NR4A2
SCHEMBL6913618 0.96 PRNP (0.73) PRNPKMT2AMEN1NR4A1NR4A2
Hydrochloric Acid SCHEMBL11734513 0.96 PRNP (0.73) PRNPKMT2AMEN1NR4A1NR4A2
SCHEMBL6913860 0.96 PRNP (0.73) PRNPKMT2AMEN1NR4A1NR4A2
SCHEMBL6913251 0.96 PRNP (0.73) PRNPKMT2AMEN1NR4A1NR4A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6830704-B2 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. (JP) 2004-12-14 US disclosed
US-20030135016-A1 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. 2003-07-17 US disclosed
US-6547985-B1 Adhesive mixture TOGOSEI CO., LTD. (JP) 2003-04-15 US disclosed