SCHEMBL6915769

SCHEMBL6915769

Cc1ccc(C(=O)O)c(C)c1C.[GaH3]

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.46
HAAO P46952 1/20 0.45
ALDH1A1 P00352 3/20 0.43
KDM4E B2RXH2 1/20 0.43
HPGD P15428 1/20 0.43
HSD17B10 Q99714 1/20 0.43
MEN1 O00255 1/20 0.43
AKR1B10 O60218 1/20 0.43
TRPA1 O75762 1/20 0.43
ABCB11 O95342 1/20 0.43
DHFR P00374 1/20 0.43
LMNA P02545 1/20 0.43
MPO P05164 1/20 0.43
CYP3A4 P08684 1/20 0.43
CHRM1 P11229 1/20 0.43
CYP2C9 P11712 1/20 0.43
AKR1B1 P15121 1/20 0.43
PTGS1 P23219 1/20 0.43
PTGS2 P35354 1/20 0.43
AKR1C3 P42330 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL242262 0.98 CYP1A2 (0.48) CYP1A2HAAOALDH1A1KDM4EHPGD
SCHEMBL29370019 0.98 CYP1A2 (0.48) CYP1A2HAAOALDH1A1KDM4EHPGD
SCHEMBL28033212 0.98 CYP1A2 (0.48) CYP1A2HAAOALDH1A1KDM4EHPGD
SCHEMBL6914735 0.95 CYP1A2 (0.46) CYP1A2HAAOALDH1A1KDM4EHPGD
SCHEMBL6913856 0.95 CYP1A2 (0.46) CYP1A2HAAOALDH1A1KDM4EHPGD
SCHEMBL6909275 0.95 CYP1A2 (0.46) CYP1A2HAAOALDH1A1KDM4EHPGD
Methane SCHEMBL28422886 0.95 CYP1A2 (0.46) CYP1A2HAAOALDH1A1KDM4EHPGD
SCHEMBL6915142 0.95 CYP1A2 (0.46) CYP1A2HAAOALDH1A1KDM4EHPGD
SCHEMBL6908109 0.95 CYP1A2 (0.46) CYP1A2HAAOALDH1A1KDM4EHPGD
SCHEMBL6913994 0.95 CYP1A2 (0.46) CYP1A2HAAOALDH1A1KDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6830704-B2 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. (JP) 2004-12-14 US disclosed
US-20030135016-A1 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. 2003-07-17 US disclosed
US-6547985-B1 Adhesive mixture TOGOSEI CO., LTD. (JP) 2003-04-15 US disclosed