⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20787035 | 0.67 | — | — | |
| SCHEMBL1060738 | 0.67 | — | — | |
| SCHEMBL8419986 | 0.64 | — | — | |
| SCHEMBL331408 | 0.62 | — | — | |
| SCHEMBL6544966 | 0.61 | — | — | |
| SCHEMBL7157374 | 0.59 | — | — | |
| SCHEMBL23212 | 0.59 | — | — | |
| SCHEMBL2778967 | 0.59 | — | — | |
| SCHEMBL23363 | 0.59 | — | — | |
| SCHEMBL7478 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116217881-A | Xylylene diisocyanate composition, polymerizable composition for optical material, resin, molded article, optical element, and lens | 三井化学株式会社 | 2023-06-06 | — | — | CN | claimed |
| CN-115667211-B | Xylylene diisocyanate composition, polymerizable composition for optical material, resin, molded article, optical element, and lens | 三井化学株式会社 | 2023-04-28 | — | — | CN | claimed |
| CN-115989217-A | Composition, and optical material and lens using the same | 三菱瓦斯化学株式会社 | 2023-04-18 | — | — | CN | claimed |
| CN-110214157-B | Composition for optical material | 三菱瓦斯化学株式会社 | 2022-10-04 | — | — | CN | claimed |
| CN-110198969-B | Composition for optical material | 三菱瓦斯化学株式会社 | 2021-09-17 | — | — | CN | claimed |
| CN-107735428-B | Composition for optical material and optical material using same | 三菱瓦斯化学株式会社 | 2020-12-04 | — | — | CN | claimed |
| US-20160159937-A1 | POLYSACCHARIDE DERIVATIVES INCLUDING AN ALKENE UNIT AND THIOL-CLICK CHEMICAL COUPLING REACTION | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE ( CNRS) (FR) | 2016-06-09 | — | — | US | claimed |
| US-20130231474-A1 | POLYSACCHARIDE DERIVATIVES INCLUDING AN ALKENE UNIT AND THIOL-CLICK CHEMICAL COUPLING REACTION | UNIVERSITE JOSEPH FOURIER - GRENOBLE 1 (FR) | 2013-09-05 | — | — | US | claimed |
| US-20120238660-A1 | METHOD FOR DYEING A PLASTIC SUBSTRATE OF HIGH REFRACTIVE INDEX AND SUBSTRATE OBTAINED BY THIS METHOD | ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) | 2012-09-20 | — | — | US | claimed |
| EP-2319981-B1 | Method for dyeing a plastic substrate of high refractive index | ESSILOR INT (FR) | 2012-02-29 | — | — | EP | claimed |
| WO-2011058460-A1 | METHOD FOR DYEING A PLASTIC SUBSTRATE OF HIGH REFRACTIVE INDEX AND SUBSTRATE OBTAINED BY THIS METHOD | Essilor International (Compagnie Générale d'Optique) (FR) | 2011-05-19 | — | — | WO | claimed |
| EP-2319981-A1 | Method for dyeing a plastic substrate of high refractive index and substrate obtained by this method | ESSILOR INTERNATIONAL (Compagnie Générale d'Optique) (FR) | 2011-05-11 | — | — | EP | claimed |
| EP-0976727-B1 | Polyisocyanate compound, process for producing the same and optical resin materials using the same | HOYA CORP (JP) | 2003-01-15 | — | — | EP | claimed |
| CN-122013171-A | Iron particle passivation | 波音公司 | 2026-05-12 | — | — | CN | disclosed |
| US-20240191035-A1 | RING OPENING POLYMERIZATION OF CYCLIC SILOXANES | CHT USA INC (US) | 2024-06-13 | — | — | US | disclosed |
| WO-2024118571-A2 | RING OPENING POLYMERIZATION OF CYCLIC SILOXANES | CHT USA INC (US) | 2024-06-06 | — | — | WO | disclosed |
| EP-0435306-A2 | Polythiol compound, and optical material and product produced therefrom | HOYA CORPORATION (JP) | 1991-07-03 | — | — | EP | disclosed |
| US-4999410-A | Acrylate ester ether derivatives | UNIVERSITY OF SOUTHERN MISSISSIPPI (US) | 1991-03-12 | — | — | US | disclosed |
| US-4889948-A | Acrylate ester ether derivatives | UNIVERSITY OF SOUTHERN MISSISSIPPI (US) | 1989-12-26 | — | — | US | disclosed |
| US-4078935-A | PHOTOGRAPHIC RECORDING, POLYMER AND METAL OXIDE SEMICONDUCTOR LAYER | FUJI PHOTO FILM CO., LTD. (JA) | 1978-03-14 | — | — | US | disclosed |