SCHEMBL6920808

SCHEMBL6920808

CC(=O)C(C)C(=O)O.[Zr]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL79779 0.97
SCHEMBL5386710 0.97
SCHEMBL701554 0.93 TP53 (0.44)
Ammonia Solution, Strong SCHEMBL14935486 0.93
SCHEMBL15654871 0.93
SCHEMBL23467150 0.93 TP53 (0.44)
SCHEMBL10956052 0.93
SCHEMBL7133114 0.93
SCHEMBL10959727 0.93
SCHEMBL125101 0.93 TP53 (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111433300-A Scratch-resistant and scratch-resistant automotive coatings 巴斯夫涂料有限公司 2020-07-17 CN disclosed
CN-104812940-A Metal surface processing agent NOK CORP 2015-07-29 CN disclosed
CN-102147577-B Electrophotographic photoreceptor, process cartridge and image forming apparatus FUJI XEROX CO LTD 2013-11-06 CN disclosed
CN-102147577-A Electrophotographic photoreceptor, process cartridge and image forming apparatus FUJI XEROX CO LTD 2011-08-10 CN disclosed
EP-1413924-A1 COMPOSITION HAVING PERMITIVITY BEING RADIATION-SENSITIVELY CHANGEABLE AND METHOD FOR FORMING PERMITIVITY PATTERN JSR Corporation (JP) 2004-04-28 EP disclosed