⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1538619 | 0.75 | — | — | |
| SCHEMBL13673678 | 0.74 | — | — | |
| SCHEMBL9622152 | 0.72 | — | — | |
| SCHEMBL16045256 | 0.72 | — | — | |
| SCHEMBL7037718 | 0.70 | — | — | |
| SCHEMBL1538786 | 0.69 | — | — | |
| SCHEMBL3889960 | 0.69 | — | — | |
| SCHEMBL2399457 | 0.69 | — | — | |
| SCHEMBL1051031 | 0.66 | — | — | |
| SCHEMBL445491 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8039049-B2 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2011-10-18 | — | — | US | claimed |
| US-7405168-B2 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMITED (JP) | 2008-07-29 | — | — | US | claimed |
| US-20080076262-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2008-03-27 | — | — | US | claimed |
| US-7345000-B2 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2008-03-18 | — | — | US | claimed |
| WO-2007040856-A2 | PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| WO-2007040834-A2 | PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| WO-2007040816-A2 | TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| US-20070077781-A1 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMTED (JP) | 2007-04-05 | — | — | US | claimed |
| WO-2006091264-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2006-08-31 | — | — | WO | claimed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | claimed |
| US-12497698-B2 | Coatings formed from the deposition of plasma-activated adducts | SOUTHWEST RESEARCH INSTITUTE (US) | 2025-12-16 | — | — | US | disclosed |
| US-20240157346-A1 | Nanocatalysts for Electrochemical Hydrogen Production and Catalyst Screening Methods | NORTHWESTERN UNIVERSITY | 2024-05-16 | — | — | US | disclosed |
| US-20200230581-A1 | NANOCATALYSTS FOR ELECTROCHEMICAL HYDROGEN PRODUCTION AND CATALYST SCREENING METHODS | NORTHWESTERN UNIVERSITY | 2020-07-23 | — | — | US | disclosed |
| US-20170321326-A1 | COATINGS FORMED FROM THE DEPOSITION OF PLASMA-ACTIVATED ADDUCTS | SHELL OIL COMPANY | 2017-11-09 | — | — | US | disclosed |
| WO-2017192984-A1 | COATINGS FORMED FROM THE DEPOSITION OF PLASMA-ACTIVATED ADDUCTS | SOUTHWEST RESEARCH INSTITUTE (US) | 2017-11-09 | — | — | WO | disclosed |
| WO-2007040856-A2 | PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | disclosed |
| US-20070077782-A1 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | disclosed |
| US-20070077353-A1 | Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | disclosed |
| US-20070077781-A1 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMTED (JP) | 2007-04-05 | — | — | US | disclosed |
| WO-2006091264-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2006-08-31 | — | — | WO | disclosed |