SCHEMBL6926944

SCHEMBL6926944

COc1ccc(NC(=O)C(Cl)(Cl)Cl)cc1OC

nearest known ligand 0.71

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.71
CYP2C19 P33261 3/20 0.71
CYP2C9 P11712 1/20 0.71
IMPDH2 P12268 1/20 0.59
IMPDH1 P20839 1/20 0.59
MAPT P10636 4/20 0.56
LMNA P02545 1/20 0.56
NPSR1 Q6W5P4 1/20 0.56
KMT2A Q03164 7/20 0.55
SMN1; SMN2 Q16637 4/20 0.55
MEN1 O00255 3/20 0.55
NPC1 O15118 2/20 0.55
RAB9A P51151 2/20 0.55
ALDH1A1 P00352 2/20 0.55
TP53 P04637 1/20 0.55
KDM4E B2RXH2 2/20 0.55
L3MBTL1 Q9Y468 1/20 0.54
MAPK1 P28482 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8102792 0.85 CYP1A2 (0.73) CYP1A2CYP2C19CYP2C9IMPDH2IMPDH1
SCHEMBL4440336 0.83 CYP1A2 (1.00) CYP1A2CYP2C19CYP2C9IMPDH2IMPDH1
SCHEMBL8345734 0.80 KMT2A (0.78) CYP1A2CYP2C19CYP2C9IMPDH2IMPDH1
SCHEMBL1030576 0.79 CYP1A2 (0.65) CYP1A2CYP2C19CYP2C9IMPDH2IMPDH1
SCHEMBL7760777 0.79 CYP1A2 (0.65) CYP1A2CYP2C19CYP2C9IMPDH2IMPDH1
SCHEMBL2091191 0.79 SMN1; SMN2 (0.67) CYP1A2CYP2C19CYP2C9IMPDH2IMPDH1
SCHEMBL30492996 0.79 SMN1; SMN2 (0.68) CYP1A2CYP2C19CYP2C9IMPDH2IMPDH1
SCHEMBL2089273 0.79 CYP1A2 (0.65) CYP1A2CYP2C19CYP2C9IMPDH2IMPDH1
SCHEMBL1851780 0.79 SMN1; SMN2 (0.68) CYP1A2CYP2C19CYP2C9IMPDH2IMPDH1
SCHEMBL6928361 0.77 NPC1 (0.63) CYP1A2CYP2C19CYP2C9MAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0911153-B1 Image forming method KONISHIROKU PHOTO IND (JP) 2003-12-10 EP disclosed
US-6174646-B1 IMAGEWISE HEATING OR EXPOSING IMAGE FORMING MATERIAL TO LASER WHEREIN IMAGE FORMING MATERIAL COMPRISES SUPPORT HAVING RADIATION SENSITIVE LAYER CONTAINING DYE, AN ACID GENERATING COMPOUND CAPABLE OF GENERATING ACID ON IRRADIATION KONICA CORPORATION (JP) 2001-01-16 US disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 EP disclosed