Ethane

Ethane

SCHEMBL6928760

CC.CC.CC.[Al].[Al]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethane SCHEMBL2233163 1.00
Ethane SCHEMBL29723104 1.00
Ethane SCHEMBL11873947 1.00
Ethane SCHEMBL6358321 0.87
Ethane SCHEMBL11041445 0.87
Ethane SCHEMBL9007730 0.87
Ethane SCHEMBL7314788 0.87
Ethane SCHEMBL10950477 0.87
Ethane SCHEMBL10952587 0.87
Ethane SCHEMBL4255988 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110452320-B Process for preparing branched polyethylene 中国石油天然气股份有限公司 2022-05-10 CN claimed
CN-106916243-B Process for producing ethylene random copolymer 中国石油天然气股份有限公司 2020-08-07 CN claimed
EP-0227124-B2 Olefinic benzocyclobutene polymers and processes for the preparation thereof SHELL INT RESEARCH (NL) 1996-01-31 EP claimed
WO-2023176705-A1 MEMBER FOR INKJET HEAD, METHOD FOR MANUFACTURING MEMBER FOR INKJET HEAD, AND INKJET HEAD コニカミノルタ株式会社 2023-09-21 WO disclosed
CN-110248892-B Macroscopic formation of carbon nanotubes by gas phase treatment 耶路撒冷希伯来大学伊森姆研究发展有限公司 2023-08-04 CN disclosed
EP-4205983-A1 NOZZLE PLATE AND INKJET HEAD KONICA MINOLTA, INC. (JP) 2023-07-05 EP disclosed
EP-2851192-A1 GAS BARRIER FILM, MANUFACTURING METHOD FOR GAS BARRIER FILM, AND ELECTRONIC DEVICE Konica Minolta, Inc. (JP) 2015-03-25 EP disclosed
US-6518384-B1 Comprising an alkyl aluminum component, an aluminum or gallium trihalide component, and, optionally, a Group 4 metallocene dihalide component SEN AYUSMAN (US) 2003-02-11 US disclosed
WO-1999028532-A1 VAPOR SOURCE FOR CHEMICAL VAPOR DEPOSITION PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 1999-06-10 WO disclosed