Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30839907 | 0.92 | ATM (0.34) | ATMNPC1RAB9ANPSR1L3MBTL1 | |
| SCHEMBL15356236 | 0.89 | ATM (0.34) | ATMNPC1RAB9ANPSR1L3MBTL1 | |
| SCHEMBL16995003 | 0.89 | ATM (0.34) | ATMNPC1RAB9ANPSR1L3MBTL1 | |
| SCHEMBL23963190 | 0.85 | CHRM2 (0.34) | ATM | |
| SCHEMBL68323 | 0.84 | ATM (0.30) | ATM | |
| SCHEMBL12932699 | 0.84 | NPC1 (0.31) | ATMNPC1RAB9ANPSR1L3MBTL1 | |
| SCHEMBL10175857 | 0.83 | — | — | |
| SCHEMBL15356235 | 0.83 | NPC1 (0.39) | ATMNPC1RAB9ANPSR1L3MBTL1 | |
| SCHEMBL14315014 | 0.83 | ATM (0.31) | ATM | |
| SCHEMBL23633736 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 152 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152692-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-11059923-B2 | Preparation method for high-solid acrylic resin | WUXI ACRYL TECHNOLOGY CO., LTD (CN) | 2021-07-13 | — | — | US | disclosed |
| EP-2105478-B1 | Inkjet recording method and inkjet recording system | FUJIFILM CORP (JP) | 2018-02-28 | — | — | EP | disclosed |
| EP-2088176-B2 | Ink composition, inkjet recording method, printed material, and molded printed material | FUJIFILM CORP (JP) | 2017-06-14 | — | — | EP | disclosed |
| US-9399693-B2 | Resin composition for photoimprinting, pattern forming process and etching mask | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2016-07-26 | — | — | US | disclosed |
| US-9399693-B2 | Resin composition for photoimprinting, pattern forming process and etching mask | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2016-07-26 | — | — | US | disclosed |
| US-8932687-B2 | Process for producing molded printed material, and molded printed material | FUJIFILM CORPORATION (JP) | 2015-01-13 | — | — | US | disclosed |
| US-8932687-B2 | Process for producing molded printed material, and molded printed material | FUJIFILM CORPORATION (JP) | 2015-01-13 | — | — | US | disclosed |
| EP-2311918-B1 | Ink composition, and inkjet recording method | FUJIFILM CORP (JP) | 2014-10-22 | — | — | EP | disclosed |
| EP-2088176-B1 | Ink composition, inkjet recording method, printed material, and molded printed material | FUJIFILM CORP (JP) | 2014-01-29 | — | — | EP | disclosed |
| US-20070289497-A1 | Coating Composition, Optical Film, Anti-reflection Film, Polarizing Plate, and Display Unit Using Them | FUJIFILM CORPORATION (JP) | 2007-12-20 | — | — | US | disclosed |
| EP-1867665-A2 | Crosslinkable methacrylic resin composition and transparent member | Mitsui Chemicals, Inc. (JP) | 2007-12-19 | — | — | EP | disclosed |
| WO-2007105826-A1 | OPTICALLY-COMPENSATORY SHEET, ELLIPSOIDAL POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2007-09-20 | — | — | WO | disclosed |
| EP-1834767-A2 | Planographic printing plate precursor | FUJIFILM Corporation (JP) | 2007-09-19 | — | — | EP | disclosed |
| US-7229695-B2 | Low refractive index layer contains a fluoropolymer and an acrylated polysiloxane graft polymer; for use in liquid crystal display units having both a high face figure uniformity and favorable scratch resistance | FUJIFILM CORPORATION (JP) | 2007-06-12 | — | — | US | disclosed |
| US-7229695-B2 | Low refractive index layer contains a fluoropolymer and an acrylated polysiloxane graft polymer; for use in liquid crystal display units having both a high face figure uniformity and favorable scratch resistance | FUJIFILM CORPORATION (JP) | 2007-06-12 | — | — | US | disclosed |
| US-20070098920-A1 | Optical film, polarizing plate and liquid crystal display | FUJIFILM CORPORATION (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070098920-A1 | Optical film, polarizing plate and liquid crystal display | FUJIFILM CORPORATION (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070002232-A1 | Optical compensation film, polarizing plate and liquid crystal display device | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-04 | — | — | US | disclosed |
| US-20070002232-A1 | Optical compensation film, polarizing plate and liquid crystal display device | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-04 | — | — | US | disclosed |