⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11170598 | 0.76 | — | — | |
| SCHEMBL27650485 | 0.73 | — | — | |
| SCHEMBL11211018 | 0.71 | — | — | |
| SCHEMBL6156953 | 0.68 | — | — | |
| SCHEMBL14560266 | 0.67 | NPC1 (0.36) | — | |
| SCHEMBL14290156 | 0.67 | NPC1 (0.36) | — | |
| SCHEMBL14571036 | 0.67 | NPC1 (0.36) | — | |
| SCHEMBL9363960 | 0.67 | — | — | |
| SCHEMBL9514913 | 0.67 | — | — | |
| SCHEMBL14560292 | 0.67 | NPC1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11718082-B2 | Method of manufacturing fine pattern and method of manufacturing display device using the same | MERCK PATENT GMBH (DE) | 2023-08-08 | — | — | US | disclosed |
| US-20210187930-A1 | METHOD OF MANUFACTURING FINE PATTERN AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAM | MERCK PATENT GMBH (DE) | 2021-06-24 | — | — | US | disclosed |
| US-20210191263-A1 | METHOD OF MANUFACTURING HIGH-DEFINED PATTERN AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAME | MERCK PATENT GMBH (DE) | 2021-06-24 | — | — | US | disclosed |
| EP-2397901-A1 | Resist pattern swelling material, and method for patterning using same | Fujitsu Limited (JP) | 2011-12-21 | — | — | EP | disclosed |
| EP-1315997-A1 | RESIST PATTERN SWELLING MATERIAL, AND METHOD FOR PATTERNING USING SAME | FUJITSU LIMITED (JP) | 2003-06-04 | — | — | EP | disclosed |
| WO-2003014830-A1 | RESIST PATTERN SWELLING MATERIAL, AND METHOD FOR PATTERNING USING SAME | FUJITSU LIMITED (JP) | 2003-02-20 | — | — | WO | disclosed |