SCHEMBL694028

SCHEMBL694028

CN(C)[Si](C)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4311561 0.95
SCHEMBL9740895 0.95
SCHEMBL640515 0.95
SCHEMBL4649250 0.95
SCHEMBL14736482 0.95
SCHEMBL1207560 0.95
SCHEMBL639785 0.95
SCHEMBL9304334 0.95
SCHEMBL16612012 0.95
SCHEMBL7219725 0.91

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 295 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117777022-A Synthesis method of 4-methylsulfonyl-1H-pyrazole 韶远科技(上海)有限公司 2024-03-29 CN claimed
CN-113936994-A Selective deposition of thin film dielectrics using surface termination chemistry 应用材料公司 2022-01-14 CN claimed
CN-107533951-B Selective deposition of thin film dielectrics using surface termination chemistry 应用材料公司 2021-10-26 CN claimed
US-20180199432-A1 Selective Deposition of Thin Film Dielectrics Using Surface Blocking Chemistry APPLIED MATERIALS, INC. 2018-07-12 US claimed
US-9911591-B2 Selective deposition of thin film dielectrics using surface blocking chemistry APPLIED MATERIALS, INC. (US) 2018-03-06 US claimed
CN-107533951-A Selective Deposition of Thin Film Dielectrics Using Surface Termination Chemistry 应用材料公司 2018-01-02 CN claimed
US-20160322213-A1 Selective Deposition Of Thin Film Dielectrics Using Surface Blocking Chemistry APPLIED MATERIALS, INC. 2016-11-03 US claimed
CN-105274338-A Sustainable process for reclaiming precious metals and base metals from e-waste ADVANCED TECH MATERIALS 2016-01-27 CN claimed
EP-2421833-B1 RESORCINOL DERIVATIVES AS HSP90 INHIBITORS NERVIANO MEDICAL SCIENCES SRL (IT) 2015-01-14 EP claimed
EP-2421833-A1 RESORCINOL DERIVATIVES AS HSP90 INHIBITORS Nerviano Medical Sciences S.r.l. (IT) 2012-02-29 EP claimed
WO-2010121963-A1 RESORCINOL DERIVATIVES AS HSP90 INHIBITORS NERVIANO MEDICAL SCIENCES S.R.L. (IT) 2010-10-28 WO claimed
EP-2134726-A1 IMPROVED PROCESS FOR PRODUCING BIS-(AMINOALKYL)-POLYSILOXANES Momentive Performance Materials Inc. (US) 2009-12-23 EP claimed
WO-2008115190-A1 IMPROVED PROCESS FOR PRODUCING BIS-(AMINOALKYL)-POLYSILOXANES MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2008-09-25 WO claimed
US-20080234441-A1 PROCESS FOR PRODUCING BIS-(AMINOALKYL)-POLYSILOXANES MOMENTIVE PERFORMANCE MATERIALS INC. 2008-09-25 US claimed
WO-2008006394-A1 PROCESS FOR THE PREPARATION OF OPTICALLY ACTIVE (4E)-5- HALO-2-ALKYLPENT-4-ENOIC ACIDS AND THEIR ESTER DERIVATIVES F.I.S. FABBRICA ITALIANA SINTETICI S.P.A (IT) 2008-01-17 WO claimed
EP-0944600-A1 PROCESS FOR CONVERTING HYDROXY HETEROAROMATICS TO ARYLAMINES HOECHST MARION ROUSSEL, INC. (US) 1999-09-29 EP claimed
EP-0746572-B1 NEW FUNCTIONALIZED INITIATORS FOR ANIONIC POLYMERIZATION FMC CORP (US) 1999-04-28 EP claimed
WO-1998023589-A1 PROCESS FOR CONVERTING HYDROXY HETEROAROMATICS TO ARYLAMINES HOECHST MARION ROUSSEL, INC. (US) 1998-06-04 WO claimed
US-20260125404-A1 HIGH PURITY MONOORGANO TIN COMPOUNDS AND METHODS FOR PREPARATION THEREOF GELEST INC (US) 2026-05-07 US disclosed
WO-1988005045-A1 LEUKOTRIENE B4 ANALOGS THE UPJOHN COMPANY (US) 1988-07-14 WO disclosed