SCHEMBL6958906

SCHEMBL6958906

C=CC(Cl)[SiH2]O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3221729 0.71
SCHEMBL3133956 0.71 TSHR (0.32)
SCHEMBL6531390 0.69
SCHEMBL9305123 0.69
SCHEMBL11045993 0.67
SCHEMBL564908 0.67
SCHEMBL1907150 0.67
SCHEMBL8088890 0.65
SCHEMBL10949705 0.63
SCHEMBL9277732 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6764809-B2 PHOTOPOLYMERIZATION NORTH CAROLINA STATE UNIVERSITY 2004-07-20 US claimed
US-20020119398-A1 CO2-processes photoresists, polymers, and photoactive compounds for microlithography UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL, THE 2002-08-29 US claimed
WO-2002031596-A1 CO2-PROCESSES PHOTORESISTS, POLYMERS, AND PHOTOACTIVE COMPOUNDS FOR MICROLITHOGRAPHY UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL (US) 2002-04-18 WO claimed
CN-100471499-C Physical bacteria resisting net liquid of human body and the producing technique YANWU CHEN (CN) 2009-03-25 CN disclosed
CN-101032627-A Antimicrobial mildewproof spraying agent for the physical deodorization of socks and shoes CHEN YANWU (CN) 2007-09-12 CN disclosed
CN-101032498-A Physical bacteria resisting net liquid of human body and the producing technique CHEN YANWU (CN) 2007-09-12 CN disclosed
US-6764809-B2 PHOTOPOLYMERIZATION NORTH CAROLINA STATE UNIVERSITY 2004-07-20 US disclosed
US-20020119398-A1 CO2-processes photoresists, polymers, and photoactive compounds for microlithography UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL, THE 2002-08-29 US disclosed
WO-2002031596-A1 CO2-PROCESSES PHOTORESISTS, POLYMERS, AND PHOTOACTIVE COMPOUNDS FOR MICROLITHOGRAPHY UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL (US) 2002-04-18 WO disclosed
EP-0014599-B1 PROCESS FOR THE PRODUCTION OF SILICONES M & T CHEMICALS, INC. (US) 1986-06-04 EP disclosed