Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRSS1 | P07477 | 9/20 | 0.54 |
| ▸ | F2 | P00734 | 3/20 | 0.54 |
| ▸ | PLG | P00747 | 1/20 | 0.54 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.54 |
| ▸ | C1S | P09871 | 1/20 | 0.54 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.54 |
| ▸ | F10 | P00742 | 2/20 | 0.48 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.47 |
| ▸ | SIRT2 | Q8IXJ6 | 1/20 | 0.47 |
| ▸ | F9 | P00740 | 1/20 | 0.46 |
| ▸ | NPC1 | O15118 | 1/20 | 0.45 |
| ▸ | RAB9A | P51151 | 1/20 | 0.45 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6952958 | 0.92 | PRSS1 (0.55) | PRSS1F2PLGPRSS2C1S | |
| SCHEMBL7900578 | 0.91 | PRSS1 (0.56) | PRSS1F2PLGPRSS2C1S | |
| SCHEMBL6960795 | 0.91 | PRSS1 (0.56) | PRSS1F2PLGPRSS2C1S | |
| SCHEMBL6953969 | 0.86 | F2 (0.61) | F2F10NR1H4 | |
| SCHEMBL6960902 | 0.84 | NPC1 (0.57) | PRSS1NPC1RAB9AFFAR1 | |
| SCHEMBL6954288 | 0.81 | KMT2A (0.59) | PRSS1F2PLGPRSS2C1S | |
| SCHEMBL6956437 | 0.81 | PRSS1 (0.49) | PRSS1F2PRSS2PRSS3F10 | |
| SCHEMBL6950948 | 0.80 | PRSS1 (0.56) | PRSS1F2PLGPRSS2C1S | |
| SCHEMBL7451728 | 0.78 | SIRT2 (0.60) | PRSS1F2PLGPRSS2C1S | |
| SCHEMBL7900723 | 0.78 | PRSS1 (0.54) | PRSS1F2PLGPRSS2C1S |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0711762-B1 | PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS | SUMITOMO CHEMICAL CO (JP) | 2003-08-06 | — | — | EP | disclosed |
| US-6277998-B1 | REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-21 | — | — | US | disclosed |
| US-6191289-B1 | REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-02-20 | — | — | US | disclosed |
| US-5874593-A | SULFUR CONTAINING AMIDE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-02-23 | — | — | US | disclosed |
| EP-0711762-A1 | PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1996-05-15 | — | — | EP | disclosed |