Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC1 | Q13547 | 1/20 | 0.54 |
| ▸ | MAOB | P27338 | 2/20 | 0.48 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.47 |
| ▸ | SIGMAR1 | Q99720 | 5/20 | 0.47 |
| ▸ | SPHK1 | Q9NYA1 | 4/20 | 0.46 |
| ▸ | MAOA | P21397 | 1/20 | 0.46 |
| ▸ | NOS1 | P29475 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6958147 | 1.00 | HDAC1 (0.54) | HDAC1MAOBHDAC8SIGMAR1SPHK1 | |
| SCHEMBL6957250 | 0.98 | HDAC1 (0.51) | HDAC1MAOBHDAC8SIGMAR1SPHK1 | |
| SCHEMBL6962838 | 0.91 | PLAU (0.51) | HDAC1MAOBHDAC8MAOANOS1 | |
| SCHEMBL6953213 | 0.87 | PLA2G4B (0.56) | MAOA | |
| SCHEMBL6950680 | 0.87 | PLA2G4B (0.56) | MAOA | |
| SCHEMBL6962917 | 0.85 | F10 (0.45) | HDAC1MAOBSIGMAR1SPHK1MAOA | |
| SCHEMBL6955519 | 0.85 | F10 (0.45) | HDAC1MAOBSIGMAR1SPHK1MAOA | |
| SCHEMBL6962301 | 0.85 | SPHK2 (0.53) | SPHK1MAPT | |
| SCHEMBL6951086 | 0.85 | SPHK2 (0.53) | SPHK1MAPT | |
| SCHEMBL6961292 | 0.85 | PLA2G4B (0.54) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0711762-B1 | PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS | SUMITOMO CHEMICAL CO (JP) | 2003-08-06 | — | — | EP | disclosed |
| US-6277998-B1 | REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-21 | — | — | US | disclosed |
| US-6191289-B1 | REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-02-20 | — | — | US | disclosed |
| US-5874593-A | SULFUR CONTAINING AMIDE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-02-23 | — | — | US | disclosed |
| EP-0711762-A1 | PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1996-05-15 | — | — | EP | disclosed |