⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6971443 | 0.85 | — | — | |
| SCHEMBL2361601 | 0.83 | HSP90AA1 (0.56) | — | |
| SCHEMBL10874845 | 0.81 | HSP90AA1 (0.59) | — | |
| SCHEMBL7047677 | 0.81 | HSP90AA1 (0.59) | — | |
| SCHEMBL20494115 | 0.81 | HSP90AA1 (0.59) | — | |
| SCHEMBL7518941 | 0.81 | HSP90AA1 (0.59) | — | |
| SCHEMBL20494306 | 0.81 | HSP90AA1 (0.59) | — | |
| SCHEMBL20494050 | 0.81 | HSP90AA1 (0.59) | — | |
| SCHEMBL648902 | 0.78 | — | — | |
| SCHEMBL3295744 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4916128-A | Thiadiazinones | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 1990-04-10 | — | — | US | claimed |
| US-4410522-A | BACTERICIDES | TOYAMA CHEMICAL CO., LTD. (JP) | 1983-10-18 | — | — | US | claimed |
| US-4327097-A | BACTERICIDES FOR MAMMALS | TOYAMA CHEMICAL CO., LTD. (JP) | 1982-04-27 | — | — | US | claimed |
| US-4219554-A | Novel penicillins and cephalosporins and process for producing same | TOYAMA CHEMICAL COMPANY, LIMITED (JP) | 1980-08-26 | — | — | US | claimed |
| CN-109709770-B | Resin composition, dry film and method for producing same, method for producing resist film and substrate, method for producing plated molded article, and mercapto compound | 东京应化工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| US-11061326-B2 | Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-13 | — | — | US | disclosed |
| US-11022880-B2 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-01 | — | — | US | disclosed |
| US-20200209739-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-07-02 | — | — | US | disclosed |
| US-20190121233-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-04-25 | — | — | US | disclosed |
| US-20190101825-A1 | CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, A PHOTOSENSITIVE DRY FILM, A METHOD FOR PRODUCING A PHOTOSENSITIVE DRY FILM, A METHOD FOR PRODUCING A PATTERNED RESIST FILM, A METHOD OF MANUFACTURING A TEMPLATE WITH A SUBSTRATE, AND A METHOD OF MANUFACTURING A PLATED SHAPED PRODUCT, AND A MERCAPTO COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-04-04 | — | — | US | disclosed |
| US-20180259853-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD FOR MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-09-13 | — | — | US | disclosed |
| EP-1027351-B1 | PHENANTHROLINE DERIVATIVES | FIBROGEN INC (US) | 2003-12-03 | — | — | EP | disclosed |
| EP-0248414-A2 | Aralkyl imidazole derivatives | CIBA-GEIGY AG (CH) | 1987-12-09 | — | — | EP | disclosed |
| US-4410522-A | BACTERICIDES | TOYAMA CHEMICAL CO., LTD. (JP) | 1983-10-18 | — | — | US | disclosed |
| US-4379152-A | Cephalosporins | TOYAMA CHEMICAL CO., LTD. (JP) | 1983-04-05 | — | — | US | disclosed |
| US-4327097-A | BACTERICIDES FOR MAMMALS | TOYAMA CHEMICAL CO., LTD. (JP) | 1982-04-27 | — | — | US | disclosed |
| US-4219554-A | Novel penicillins and cephalosporins and process for producing same | TOYAMA CHEMICAL COMPANY, LIMITED (JP) | 1980-08-26 | — | — | US | disclosed |
| US-4112090-A | BACTERICIDE | TOYAMA CHEMICAL CO., LTD. (JP) | 1978-09-05 | — | — | US | disclosed |
| US-4110327-A | BACTERICIDES | TOYAMA CHEMICAL CO., LTD. (JP) | 1978-08-29 | — | — | US | disclosed |
| US-4087424-A | Novel penicillins and cephalosporins and process for producing the same | TOYAMA CHEMICAL CO., LTD. (JA) | 1978-05-02 | — | — | US | disclosed |