Acrylic Acid

Acrylic Acid

SCHEMBL6982262

C=C(C)C(=O)OCC(O)CO.C=CC(=O)O

nearest known ligand 0.50

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Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.50
LMNA P02545 3/20 0.38
KDM4E B2RXH2 1/20 0.38
DUSP3 P51452 1/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
DGKA P23743 1/20 0.36
THRB P10828 1/20 0.36
FAAH O00519 2/20 0.35
ALDH1A1 P00352 3/20 0.34
USP2 O75604 2/20 0.34
CYP3A4 P08684 2/20 0.34
MAPT P10636 2/20 0.34
SMN1; SMN2 Q16637 2/20 0.34
HPGD P15428 1/20 0.34
RECQL P46063 1/20 0.32
TGFBR1 P36897 1/20 0.32
ALOX15 P16050 1/20 0.32
HSD17B10 Q99714 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL28165263 0.98 TSHR (0.49) TSHRLMNAKDM4EDUSP3MEN1
Methacrylic Acid SCHEMBL11411822 0.90 TSHR (0.41) TSHRLMNAKDM4EDUSP3MEN1
Propene SCHEMBL28456176 0.90 TSHR (0.53) TSHRLMNAKDM4EDUSP3MEN1
Bicarbonate SCHEMBL28904630 0.90 TSHR (0.57) TSHRLMNAKDM4EDUSP3MEN1
SCHEMBL25707 0.89 TSHR (0.61) TSHRLMNAKDM4EDUSP3MEN1
SCHEMBL16863053 0.89 TSHR (0.61) TSHRLMNAKDM4EDUSP3MEN1
SCHEMBL29375450 0.89 TSHR (0.61) TSHRLMNAKDM4EDUSP3MEN1
SCHEMBL5606160 0.89 TSHR (0.49) TSHRLMNAKDM4EDUSP3MEN1
Methacrylic Acid SCHEMBL25415594 0.88 TSHR (0.55) TSHRLMNAKDM4EDUSP3MEN1
Methacrylic Acid SCHEMBL5435140 0.88 TSHR (0.55) TSHRLMNAKDM4EDUSP3MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115232581-A Acrylic resin binder with interpenetrating network structure and preparation method thereof 陕西科技大学 2022-10-25 CN disclosed
CN-109790243-A Three block prepolymer and its purposes in silicone hydrogels 庄臣及庄臣视力保护公司 2019-05-21 CN disclosed
CN-109790353-A SILICONE HYDROGELS COMPRISING POLYAMIDES 庄臣及庄臣视力保护公司 2019-05-21 CN disclosed
CN-109415474-A SILICONE HYDROGELS COMPRISING HIGH LEVELS OF POLYAMIDES 庄臣及庄臣视力保护公司 2019-03-01 CN disclosed
CN-108473614-A The manufacturing method of water-absorbing resins 株式会社日本触媒 2018-08-31 CN disclosed
CN-105622835-A Composition for preparing anti-blue-violet contact lens and anti-blue-violet contact lens JIUYANG TRADING CO LTD 2016-06-01 CN disclosed
CN-105612438-A Microstructured diffuser comprising a first microstructured layer and a coating, optical stack, and method 3M INNOVATIVE PROPERTIES CO 2016-05-25 CN disclosed
CN-103959140-B There is the silicone hydrogels soft contact lens of wettable surface HOYA CORP. (JP) 2016-05-04 CN disclosed
CN-105474007-A Biosensor and method for measuring the same NAT UNIV CORP THE UNIV OF TOKYO 2016-04-06 CN disclosed
CN-105452404-A Cured film-forming composition, alignment material, and phase difference material NISSAN CHEMICAL IND LTD 2016-03-30 CN disclosed
CN-100478401-C Water-absorbing agent and process for producing the same NIPPON CATALYTIC CHEM IND (JP) 2009-04-15 CN disclosed
CN-1824708-A Water-absorbing agent and process for producing the same NIPPON CATALYTIC CHEM IND (JP) 2006-08-30 CN disclosed
CN-1813033-A Water-absorbent resin composition and method for producing the same NIPPON CATALYTIC CHEM IND (JP) 2006-08-02 CN disclosed
CN-1246046-C Water absorbing agent and method for producing same NIPPON CATALYTIC CHEM IND (JP) 2006-03-22 CN disclosed
EP-0751161-B1 Sulfur-containing urethane-based resin composition, optical element and lens comprising this resin MITSUI CHEMICALS INC (JP) 2003-01-02 EP disclosed
CN-1349830-A Water absorbing agent and method for producing same NIPPON CATALYTIC CHEM IND (JP) 2002-05-22 CN disclosed
CN-1082968-C Sulfur-containing urethane-based resin composition, its resin, and optical element and lens comprising resin thereof MITSUI CHEMICALS INC (JP) 2002-04-17 CN disclosed
US-5736609-A A POLYTHIO COMPOUND CONTAINING AT LEAST TWO MERCAPTO GROUPS, A POLYISO(THIO)CYANATE COMPOUND, AND A COMPOUND HAVING TWO OR MORE UNSATURATED REACTIVE GROUPS MITSUI TOATSU CHEMICALS, INC. (JP) 1998-04-07 US disclosed
CN-1148055-A Sulfur-containing urethane-based resin composition, its resin, and optical element and lens comprising resin thereof MITSUI TOATSU CHEMICALS (JP) 1997-04-23 CN disclosed
EP-0751161-A2 Sulfur-containing urethane-based resin composition, optical element and lens comprising this resin MITSUI TOATSU CHEMICALS, Inc. (JP) 1997-01-02 EP disclosed