⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18099460 | 0.86 | — | — | |
| SCHEMBL24152446 | 0.54 | — | — | |
| Hydrochloric Acid SCHEMBL20502475 | 0.54 | — | — | |
| SCHEMBL8697717 | 0.49 | — | — | |
| SCHEMBL10245398 | 0.46 | — | — | |
| SCHEMBL21737153 | 0.44 | — | — | |
| SCHEMBL24923431 | 0.44 | — | — | |
| SCHEMBL8600614 | 0.42 | — | — | |
| SCHEMBL8883391 | 0.42 | — | — | |
| SCHEMBL18575197 | 0.42 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8182977-B2 | Polymer and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-8124314-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100239981-A1 | POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100203452-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-08-12 | — | — | US | disclosed |