Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | SCN9A | Q15858 | 5/20 | 0.32 |
| ▸ | BRS3 | P32247 | 2/20 | 0.31 |
| ▸ | CNR2 | P34972 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL700295 | 0.80 | BRS3 (0.36) | ATMSCN9ABRS3CNR2 | |
| SCHEMBL29145056 | 0.80 | — | — | |
| SCHEMBL5533834 | 0.73 | SCN9A (0.38) | ATMSCN9ABRS3 | |
| SCHEMBL18195838 | 0.70 | SCN9A (0.35) | ATMSCN9ABRS3 | |
| SCHEMBL14779292 | 0.70 | ATM (0.40) | ATMSCN9ABRS3 | |
| SCHEMBL18785584 | 0.69 | ATM (0.35) | ATMSCN9A | |
| SCHEMBL3257974 | 0.68 | ATM (0.39) | ATMSCN9ABRS3 | |
| SCHEMBL14837086 | 0.68 | ATM (0.39) | ATMSCN9ABRS3 | |
| SCHEMBL14837217 | 0.68 | ATM (0.39) | ATMSCN9ABRS3 | |
| SCHEMBL14778092 | 0.67 | ATM (0.38) | ATMSCN9ABRS3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4058848-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | Merck Patent GmbH (DE) | 2022-09-21 | — | — | EP | disclosed |
| EP-3847506-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | Merck Patent GmbH (DE) | 2021-07-14 | — | — | EP | disclosed |
| US-20120164586-A1 | PATERN FORMING METHOD | JSR CORPORATION (JP) | 2012-06-28 | — | — | US | disclosed |
| US-8124314-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100203452-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-08-12 | — | — | US | disclosed |