⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4067305 | 0.80 | CYP2C9 (0.38) | — | |
| SCHEMBL11453618 | 0.74 | CYP2C9 (0.33) | — | |
| SCHEMBL19217890 | 0.67 | — | — | |
| SCHEMBL26370610 | 0.65 | CYP2C9 (0.35) | — | |
| SCHEMBL22073526 | 0.65 | CYP2C9 (0.35) | — | |
| SCHEMBL25630117 | 0.65 | CYP2C9 (0.35) | — | |
| SCHEMBL3282039 | 0.65 | CYP2C9 (0.35) | — | |
| SCHEMBL6456147 | 0.65 | CYP2C9 (0.41) | — | |
| SCHEMBL26364080 | 0.65 | CYP2C9 (0.35) | — | |
| SCHEMBL24385264 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105683154-B | Cyanate ester compound, curable resin composition containing the same, and cured product thereof | 三菱瓦斯化学株式会社 | 2018-03-16 | — | — | CN | disclosed |
| CN-105683154-A | Cyanate ester compound, curable resin composition containing the same, and cured product thereof | 三菱瓦斯化学株式会社 | 2016-06-15 | — | — | CN | disclosed |
| US-8802348-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-08-12 | — | — | US | disclosed |
| US-8377627-B2 | Compound and radiation-sensitive composition | JSR CORPORATION (JP) | 2013-02-19 | — | — | US | disclosed |
| EP-1961739-B1 | NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION | JSR CORP (JP) | 2012-10-17 | — | — | EP | disclosed |
| US-8273837-B2 | Compound, polymer, and resin composition | JSR CORPORATION (JP) | 2012-09-25 | — | — | US | disclosed |
| US-20120164586-A1 | PATERN FORMING METHOD | JSR CORPORATION (JP) | 2012-06-28 | — | — | US | disclosed |
| US-8182977-B2 | Polymer and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-8124314-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-8084188-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2011-12-27 | — | — | US | disclosed |
| US-7452655-B2 | Acrylic copolymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-11-18 | — | — | US | disclosed |
| EP-1961739-A1 | NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |
| EP-1953595-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-20070148585-A1 | Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer | LION CORPORATION. | 2007-06-28 | — | — | US | disclosed |
| EP-1698645-A1 | HYPERBRANCHED POLYMER, PROCESS FOR PRODUCING THE SAME AND RESIST COMPOSITION CONTAINING THE HYPERBRANCHED POLYMER | Lion Corporation (JP) | 2006-09-06 | — | — | EP | disclosed |
| US-20060074139-A1 | Acrylic copolymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-04-06 | — | — | US | disclosed |
| EP-1586594-A1 | ACRYLIC COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-6403280-B1 | TERPOLYMER COMPRISING MALEIC ANHYDRIDE, NORBORNENE ESTER DERIVATIVE, AND ALICYCLIC (METH)ACRYLATE MONOMERS; DURABILITY TO DRY ETCHING; TRANSPARENCY, STORAGE STABILITY | JSR CORPORATION (JP) | 2002-06-11 | — | — | US | disclosed |
| CN-1332205-A | Radiation-sensitive resin composition | JSR CORP (JP) | 2002-01-23 | — | — | CN | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |