SCHEMBL702293

SCHEMBL702293

C[Si](C)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Nitrous Acid SCHEMBL21627245 0.71
SCHEMBL2135 0.61
Iodide SCHEMBL8111229 0.55
Bromide SCHEMBL8777920 0.55
SCHEMBL783039 0.50
SCHEMBL9238219 0.50
SCHEMBL7791063 0.50
SCHEMBL22361648 0.50
SCHEMBL128723 0.50
SCHEMBL9551515 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120149558-A Lithium battery low-temperature electrolyte and lithium ion battery 深圳北理莫斯科大学 2025-06-13 CN claimed
JP-11119436-A None JP disclosed
CN-120149558-A Lithium battery low-temperature electrolyte and lithium ion battery 深圳北理莫斯科大学 2025-06-13 CN disclosed
CN-114341098-B Method for producing cyclopentane compound, method for producing lactone compound, method for producing diol compound, and compound 国立大学法人东北大学 2024-03-12 CN disclosed
US-11731992-B2 Method for preparing halosilane compounds SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-22 US disclosed
CN-115702871-A Solid cosmetic and method for producing same 株式会社资生堂 2023-02-17 CN disclosed
US-20220356195-A1 METHOD FOR PREPARING HALOSILANE COMPOUNDS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-11-10 US disclosed
CN-114341098-A Method for producing cyclopentane compound, method for producing lactone compound, method for producing diol compound, and compound 国立大学法人东北大学 2022-04-12 CN disclosed
CN-107148453-B Photocurable composition 思美定株式会社 2021-08-17 CN disclosed
CN-107428891-B Curable composition 施敏打硬株式会社 2021-04-20 CN disclosed
WO-2016032792-A1 FLUOROSILICON NITRILE COMPOUNDS ARKEMA INC. (US) 2016-03-03 WO disclosed
US-8124690-B2 Moisture curable polymer having SiF group, and curable composition containing the same KANEKA CORPORATION (JP) 2012-02-28 US disclosed
US-20090275702-A1 MOISTURE CURABLE POLYMER HAVING SiF GROUP, AND CURABLE COMPOSITION CONTAINING THE SAME KANEKA CORPORATION (JP) 2009-11-05 US disclosed
EP-2062929-A1 MOISTURE-CURABLE POLYMER HAVING SiF GROUP AND CURABLE COMPOSITION CONTAINING THE SAME Kaneka Corporation (JP) 2009-05-27 EP disclosed
US-6310257-B2 ACIDOLYSIS OF EPOXIDE COMPOUND TO FORM CYCLOPENTENE DERIVATIVE NISSAN CHEMICAL INDUSTRIES, LTD (JP) 2001-10-30 US disclosed
US-20010012907-A1 Substituted cyclopentene derivatives and method for preparing the same NISSAN CHEMICAL INDUSTRIES, LTD. 2001-08-09 US disclosed
US-6191291-B1 OXIDATION OF A SUBSTITUTED CYCLOPENTADIENE DERIVATIVE WITH AN OXIDIZING AGENT TO FORM OXIRANE RING CONTAINING SUBSTITUTED CYCLOPENTADIENE DERIVATIVE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2001-02-20 US disclosed
US-6025518-A Substituted cyclopentene derivatives and method for preparing the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2000-02-15 US disclosed
JP-H11119436-A PHOTORESIST CLOSE ADHESION MATERIAL AND METHOD FOR FORMING PHOTORESIST FILM MIYAZAKI OKI ELECTRIC CO LTD 1999-04-30 JP disclosed
US-5874634-A Substituted cyclopentene derivatives and method for preparing the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 1999-02-23 US disclosed