Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GLA | P06280 | 1/20 | 0.67 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.56 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | MAPT | P10636 | 2/20 | 0.48 |
| ▸ | POLB | P06746 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | ALKBH5 | Q6P6C2 | 1/20 | 0.44 |
| ▸ | SUCNR1 | Q9BXA5 | 1/20 | 0.44 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.44 |
| ▸ | APEX1 | P27695 | 1/20 | 0.42 |
| ▸ | HTR1A | P08908 | 1/20 | 0.41 |
| ▸ | HTR7 | P34969 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | PAOX | Q6QHF9 | 1/20 | 0.40 |
| ▸ | KDM1A | O60341 | 1/20 | 0.40 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.40 |
| ▸ | ITGB3 | P05106 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3973280 | 1.00 | GLA (0.67) | GLACYP1A2MAPK1SMN1; SMN2ALDH1A1 | |
| SCHEMBL1069692 | 1.00 | — | — | |
| SCHEMBL6536452 | 1.00 | GLA (0.67) | GLACYP1A2MAPK1SMN1; SMN2ALDH1A1 | |
| Ammonia Solution, Strong SCHEMBL9352555 | 0.97 | — | — | |
| Ethylene Glycol SCHEMBL673538 | 0.92 | GLA (0.59) | GLACYP1A2MAPK1SMN1; SMN2ALDH1A1 | |
| Propane SCHEMBL1995071 | 0.92 | GLA (0.59) | GLACYP1A2MAPK1SMN1; SMN2ALDH1A1 | |
| SCHEMBL30918304 | 0.92 | GLA (0.59) | GLACYP1A2MAPK1SMN1; SMN2ALDH1A1 | |
| SCHEMBL9058899 | 0.92 | CYP1A2 (0.61) | GLACYP1A2MAPK1SMN1; SMN2ALDH1A1 | |
| SCHEMBL9131420 | 0.92 | CYP1A2 (0.61) | GLACYP1A2MAPK1SMN1; SMN2ALDH1A1 | |
| SCHEMBL4350905 | 0.92 | CYP1A2 (0.61) | GLACYP1A2MAPK1SMN1; SMN2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 130 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119798629-A | Heat-resistant polyester polyol and preparation method and application thereof | 万华化学集团股份有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-116478095-A | Preparation method and application of imidazoline corrosion inhibitor with adsorption end containing multiple nitrogen atoms | 常州大学 | 2023-07-25 | — | — | CN | claimed |
| EP-1152901-B1 | PRINTABLE MEDIA AND METHOD FOR ITS' PREPARATION BY INK-JET PRINTING | KODAK POLYCHROME GRAPHICS LLC (US) | 2003-07-09 | — | — | EP | claimed |
| EP-1152901-A1 | PRINTABLE MEDIA AND METHOD FOR ITS' PREPARATION BY INK-JET PRINTING | Kodak Polychrome Graphics LLC (US) | 2001-11-14 | — | — | EP | claimed |
| US-6245421-B1 | THERMOPLASTIC INK RECEIVERS | KODAK POLYCHROME GRAPHICS LLC | 2001-06-12 | — | — | US | claimed |
| EP-1077812-A2 | MATERIAL FOR LITHOGRAPHIC PRINTING AND INK-JET PROCESS FOR ITS' PREPARATION | Kodak Polychrome Graphics Company Ltd. (US) | 2001-02-28 | — | — | EP | claimed |
| WO-2000046038-A2 | MATERIAL FOR LITHOGRAPHIC PRINTING AND INK-JET PROCESS FOR IT'S PREPARATION | KODAK POLYCHROME GRAPHICS COMPANY LTD. (US) | 2000-08-10 | — | — | WO | claimed |
| WO-2000046034-A1 | PRINTABLE MEDIA AND METHOD FOR ITS PREPARATION BY INK-JET PRINTING | KODAK POLYCHROME GRAPHICS LLC (US) | 2000-08-10 | — | — | WO | claimed |
| US-12503565-B2 | Selective depolymerisation of polyamide 6 to produce caprolactam from mixtures of caprolactam-containing polymers and polyurethane-containing polymers, in particular polyurethane block copolymers | BASF SE (DE) | 2025-12-23 | — | — | US | disclosed |
| CN-116478095-B | Preparation method and application of imidazoline corrosion inhibitor with adsorption end containing multiple nitrogen atoms | 常州大学 | 2025-07-11 | — | — | CN | disclosed |
| CN-119798629-A | Heat-resistant polyester polyol and preparation method and application thereof | 万华化学集团股份有限公司 | 2025-04-11 | — | — | CN | disclosed |
| US-20240117142-A1 | SELECTIVE DEPOLYMERISATION OF POLYAMIDE 6 TO PRODUCE CAPROLACTAM FROM MIXTURES OF CAPROLACTAM-CONTAINING POLYMERS AND POLYURETHANE-CONTAINING POLYMERS, IN PARTICULAR POLYURETHANE BLOCK COPOLYMERS | BASF SE (DE) | 2024-04-11 | — | — | US | disclosed |
| EP-4263687-A1 | SELECTIVE DEPOLYMERISATION OF POLYAMIDE 6 TO PRODUCE CAPROLACTAM FROM MIXTURES OF CAPROLACTAM-CONTAINING POLYMERS AND POLYURETHANE-CONTAINING POLYMERS, IN PARTICULAR POLYURETHANE BLOCK COPOLYMERS | BASF SE (DE) | 2023-10-25 | — | — | EP | disclosed |
| CN-116478095-A | Preparation method and application of imidazoline corrosion inhibitor with adsorption end containing multiple nitrogen atoms | 常州大学 | 2023-07-25 | — | — | CN | disclosed |
| US-4220704-A | Water soluble photosensitive resin compositions comprising a polyamide or its salt | TOYOBO CO., LTD. (JP) | 1980-09-02 | — | — | US | disclosed |
| US-4188221-A | REACTION PRODUCT OF (METH)ACRYLIC ACID AND A POLYGLYCIDYL ETHER OF A POLYOL, MOISTURE RESISTANCE | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1980-02-12 | — | — | US | disclosed |
| US-4187112-A | Photosensitive plate containing nitrogen containing condensation type polyesters | TOYOBO CO., LTD. (JP) | 1980-02-05 | — | — | US | disclosed |
| US-4145222-A | Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt | TOYOBO CO., LTD. (JP) | 1979-03-20 | — | — | US | disclosed |
| US-4126467-A | POLYMER HAVING REPEATING PIPERAZING-CONTAINING UNITS | FUJI PHOTO FILM CO., LTD. (JP) | 1978-11-21 | — | — | US | disclosed |
| US-4096123-A | COPOLYMER CONTAINING A TERTIARY AMINO GROUP | TOYO BOSEKI KABUSHIKI KAISHA (JA) | 1978-06-20 | — | — | US | disclosed |