Pentanal

Pentanal

SCHEMBL7033338

CCCCC=O.[Ta].[W]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Pentanal SCHEMBL36088 0.97
Pentanal SCHEMBL4581160 0.97
Pentanal SCHEMBL17201873 0.94
Pentanal SCHEMBL7803290 0.94
Pentanal SCHEMBL622584 0.94 TSHR (1.00)
Pentanal SCHEMBL28721 0.94
Pentanal SCHEMBL28603732 0.91 TSHR (0.82)
Pentanal SCHEMBL4430016 0.90
Pentanal SCHEMBL7624050 0.90
Pentanal SCHEMBL24385 0.90

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6579806-B2 Method of etching tungsten or tungsten nitride in semiconductor structures APPLIED MATERIALS INC. 2003-06-17 US disclosed
US-20030003757-A1 Method of etching tungsten or tungsten nitride in semiconductor structures NALLAN PADMAPANI (US) 2003-01-02 US disclosed
US-6440870-B1 ACCURACY CONTROL OF ETCHING USING PLASMA APPLIED MATERIALS, INC. 2002-08-27 US disclosed