Sugi Predict

Sugi Predict / Compounds / Dipyridyl

Dipyridyl

Dipyridyl

SCHEMBL703428

O=[N+]([O-])[O-].O=[N+]([O-])[O-].[Ni+2].c1ccc(-c2ccccn2)nc1

nearest known ligand 0.67

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 8/20 0.67
▸ LMNA P02545 3/20 0.67
▸ CCR1 P32246 3/20 0.67
▸ CCR5 P51681 3/20 0.67
▸ CCR8 P51685 3/20 0.67
▸ P4HTM Q9NXG6 2/20 0.67
▸ METAP1 P53582 2/20 0.67
▸ CYP1A2 P05177 1/20 0.67
▸ POLB P06746 1/20 0.67
▸ BLM P54132 1/20 0.67
▸ HIF1A Q16665 1/20 0.67
▸ DOHH Q9BU89 1/20 0.67
▸ NPC1 O15118 5/20 0.56
▸ RAB9A P51151 5/20 0.56
▸ TP53 P04637 3/20 0.56
▸ L3MBTL1 Q9Y468 3/20 0.56
▸ ALOX15 P16050 2/20 0.56
▸ HTT P42858 2/20 0.56
▸ SMN1; SMN2 Q16637 2/20 0.56
▸ TDP1 Q9NUW8 2/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Dipyridyl SCHEMBL29769825 0.95 KDM4E (0.67) KDM4ELMNACCR1CCR5CCR8
Dipyridyl SCHEMBL28763261 0.95 KDM4E (0.67) KDM4ELMNACCR1CCR5CCR8
Dipyridyl SCHEMBL809405 0.95 KDM4E (0.67) KDM4ELMNACCR1CCR5CCR8
Dipyridyl SCHEMBL27800640 0.95 KDM4E (0.67) KDM4ELMNACCR1CCR5CCR8
Dipyridyl SCHEMBL6280543 0.95 KDM4E (0.67) KDM4ELMNACCR1CCR5CCR8
Dipyridyl SCHEMBL11764780 0.95 KDM4E (0.67) KDM4ELMNACCR1CCR5CCR8
Dipyridyl SCHEMBL11764778 0.95 KDM4E (0.67) KDM4ELMNACCR1CCR5CCR8
Dipyridyl SCHEMBL29085081 0.95 KDM4E (0.67) KDM4ELMNACCR1CCR5CCR8
Dipyridyl SCHEMBL28342187 0.95 KDM4E (0.67) KDM4ELMNACCR1CCR5CCR8
Dipyridyl SCHEMBL794981 0.95 KDM4E (0.67) KDM4ELMNACCR1CCR5CCR8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111164070-A Multi-step method for producing hexamethylene diisocyanate, pentamethylene diisocyanate or toluene diisocyanate 科思创德国股份有限公司 2020-05-15 — — CN disclosed
US-8729219-B2 Polyarylene block copolymer having sulfonic acid group and use thereof JSR CORPORATION (JP) 2014-05-20 — — US disclosed
US-20130085236-A1 POLYARYLENE BLOCK COPOLYMER HAVING SULFONIC ACID GROUP AND USE THEREOF JSR CORPORATION (JP) 2013-04-04 — — US disclosed
EP-2112133-B1 Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same JSR CORP (JP) 2012-07-04 — — EP disclosed
EP-1693405-B1 PROTON CONDUCTING MEMBRANE AND PROCESS FOR PRODUCING THE SAME JSR CORP (JP) 2012-05-02 — — EP disclosed
US-20120052412-A1 POLYARYLENE BLOCK COPOLYMER HAVING SULFONIC ACID GROUP AND USE THEREOF HONDA MOTOR CO., LTD. (JP) 2012-03-01 — — US disclosed
EP-2424018-A1 Polyarylene block copolymer having sulfonic acid group and use thereof JSR Corporation (JP) 2012-02-29 — — EP disclosed
EP-1845122-B1 POLYARYLENE, PROCESS FOR PRODUCING THE SAME, SOLID POLYELECTROLYTE, AND PROTON-CONDUCTIVE FILM JSR CORP (JP) 2011-11-16 — — EP disclosed
US-8058365-B2 Proton conducting membrane and process for producing the same JSR CORPORATION (JP) 2011-11-15 — — US disclosed
US-8039165-B2 Proton conductive membrane comprising a copolymer JSR CORPORATION (JP) 2011-10-18 — — US disclosed
US-20020172652-A1 Composition for film formation and material for insulating film formation JSR CORPORATION (JP) 2002-11-21 — — US disclosed
EP-1245555-A1 Halogenated aromatic compound, polymer thereof, and proton-conductive membrane comprising same JSR Corporation (JP) 2002-10-02 — — EP disclosed
US-20020064953-A1 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORPORATION (JP) 2002-05-30 — — US disclosed
EP-1188807-A2 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR Corporation (JP) 2002-03-20 — — EP disclosed
US-20010037000-A1 Polyarylene copolymers and proton-conductive membrane JSR CORPORATION (JP) 2001-11-01 — — US disclosed
EP-0956312-B1 PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL JSR CORP (JP) 2001-10-10 — — EP disclosed
US-6300465-B1 Process for producing phenylene-containing polymer and film-forming material JSR CORPORATION (JP) 2001-10-09 — — US disclosed
EP-1138712-A2 Polyarylene copolymers and proton-conductive membrane JSR Corporation (JP) 2001-10-04 — — EP disclosed
EP-0956312-A1 PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL JSR Corporation (JP) 1999-11-17 — — EP disclosed
WO-1998033836-A1 PROCESS FOR PRODUCING PHENYLENE-CONTAINING POLYMER AND FILM-FORMING MATERIAL JSR CORPORATION (JP) 1998-08-06 — — WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020172652-A1 Composition for film formation and material for insulating film formation VCL, BMI1, PUF60 KDM4E 318/4885LMNA 1305/4885CCR1 3954/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.