⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31163041 | 0.74 | — | — | |
| SCHEMBL2458744 | 0.59 | — | — | |
| SCHEMBL83146 | 0.59 | — | — | |
| SCHEMBL28870000 | 0.59 | — | — | |
| SCHEMBL23701320 | 0.58 | — | — | |
| SCHEMBL18499150 | 0.56 | — | — | |
| SCHEMBL7101666 | 0.56 | — | — | |
| SCHEMBL5265850 | 0.56 | — | — | |
| SCHEMBL21081836 | 0.56 | — | — | |
| SCHEMBL13958883 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2018170382-A1 | SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | WO | claimed |
| CN-101379022-B | Benzamide and heteroarene derivatives | HOFFMANN LA ROCHE | 2013-05-01 | — | — | CN | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| CN-101379022-A | Benzamide and heteroarene derivatives | HOFFMANN LA ROCHE (CH) | 2009-03-04 | — | — | CN | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| EP-0305855-B1 | SYNTHESIS OF SILYL KETENE ACETAL FROM ALLYL 2-ORGANOACRYLATES | DOW CORNING CORPORATION (US) | 1993-09-15 | — | — | EP | disclosed |
| EP-0305855-A2 | Synthesis of silyl ketene acetal from allyl 2-organoacrylates | DOW CORNING CORPORATION (US) | 1989-03-08 | — | — | EP | disclosed |
| US-4746750-A | HYDROSILATION, CLEAVAGE OF PROPYLENE, REARRANGEMENTS | DOW CORNING CORPORATION (US) | 1988-05-24 | — | — | US | disclosed |