SCHEMBL7048029

SCHEMBL7048029

CC1(OC(=O)C2CC3CC(OC(=O)O)C2C3)CCCC1

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
SCN1A P35498 1/20 0.33
SCN2A Q99250 1/20 0.33
SCN3A Q9NY46 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17320462 0.86 SCN1A (0.34) SCN1ASCN2ASCN3A
SCHEMBL14982797 0.85 SCN1A (0.31) SCN1ASCN2ASCN3A
SCHEMBL6753841 0.85 SCN1A (0.31) SCN1ASCN2ASCN3A
SCHEMBL14982792 0.84 SCN1A (0.30) SCN1ASCN2ASCN3A
SCHEMBL13840479 0.84 SCN1A (0.30) SCN1ASCN2ASCN3A
SCHEMBL47443 0.81 SCN1A (0.31) SCN1ASCN2ASCN3A
SCHEMBL824257 0.81
SCHEMBL47447 0.80 SCN1A (0.31) SCN1ASCN2ASCN3A
SCHEMBL824224 0.80
SCHEMBL18175706 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030219680-A1 Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams JSR CORPORATION (JP) 2003-11-27 US disclosed