SCHEMBL7051376

SCHEMBL7051376

CCCOc1cccc2sc3ccccc3c(=O)c12

nearest known ligand 0.51

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.51
RAB9A P51151 3/20 0.51
MAPT P10636 3/20 0.51
CYP1A2 P05177 2/20 0.51
CYP3A4 P08684 2/20 0.51
CYP2C19 P33261 2/20 0.51
CYP2C9 P11712 1/20 0.51
HPGD P15428 1/20 0.51
TDP1 Q9NUW8 2/20 0.45
MAOA P21397 8/20 0.44
MAOB P27338 8/20 0.44
MEN1 O00255 3/20 0.43
KMT2A Q03164 3/20 0.43
CYP2A6 P11509 1/20 0.43
ALDH1A1 P00352 3/20 0.42
POLB P06746 1/20 0.42
GAA P10253 1/20 0.42
KDM4E B2RXH2 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3252488 0.88 MAPT (0.54) NPC1RAB9AMAPTCYP1A2CYP3A4
SCHEMBL15473229 0.88 HTR1B (0.41) NPC1RAB9AMAPTCYP1A2CYP3A4
SCHEMBL31730228 0.86 NPC1 (0.48) NPC1RAB9AMAPTCYP1A2CYP3A4
SCHEMBL1254776 0.86 NPC1 (0.48) NPC1RAB9AMAPTCYP1A2CYP3A4
SCHEMBL7923749 0.86 NPC1 (0.48) NPC1RAB9AMAPTCYP1A2CYP3A4
SCHEMBL21206927 0.85 MAPT (0.54) NPC1RAB9AMAPTCYP1A2CYP3A4
SCHEMBL16414428 0.85 NPC1 (0.45) NPC1RAB9AMAPTCYP1A2CYP3A4
SCHEMBL28004808 0.84 NPC1 (0.47) NPC1RAB9AMAPTCYP1A2CYP3A4
SCHEMBL148030 0.84 MAPT (0.53) NPC1RAB9AMAPTCYP1A2CYP3A4
SCHEMBL29573388 0.84 MAPT (0.53) NPC1RAB9AMAPTCYP1A2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104177992-B A kind of pottery radiation curing acrylate resin coating 苏州洛特兰新材料科技有限公司 2016-06-15 CN claimed
CN-105624793-A In-situ modification cedar oil filling emerald stock solution and filling method thereof UNIV SHENYANG CHEMICAL TECH 2016-06-01 CN claimed
CN-103897077-B Containing the water-soluble polymerizable thioxanthone photo initiator and preparation method thereof of hydrogen donor YANGCHENG INSTITUTE OF TECHNOLOGY (CN) 2016-03-02 CN claimed
CN-103952062-A Preparation method of dually-cured photo-polymerization composition and application of obtained composition GUANGZHOU SHENWEI NEW MATERIAL TECHNOLOGY CO LTD 2014-07-30 CN claimed
CN-103897077-A Hydrogen donor-containing water soluble polymerizable thioxanthone photoinitiator and preparation method thereof YANCHENG INST TECHNOLOGY 2014-07-02 CN claimed
US-20240181696-A1 METHODOLOGIES TO RAPIDLY CURE AND COAT PARTS PRODUCED BY ADDITIVE MANUFACTURING AZUL 3D INC (US) 2024-06-06 US disclosed
US-11897195-B2 Methodologies to rapidly cure and coat parts produced by additive manufacturing Azul 3D, Inc. (US) 2024-02-13 US disclosed
WO-2023171613-A1 PHOTOCURABLE COMPOSITION, SEALING MATERIAL FOR LIQUID CRYSTAL DISPLAY DEVICES, AND LIQUID CRYSTAL DISPLAY DEVICE 三井化学株式会社 2023-09-14 WO disclosed
US-20230078119-A1 METHODOLOGIES TO RAPIDLY CURE AND COAT PARTS PRODUCED BY ADDITIVE MANUFACTURING AZUL 3D INC (US) 2023-03-16 US disclosed
US-11534966-B2 Methodologies to rapidly cure and coat parts produced by additive manufacturing Azul 3D, Inc. (US) 2022-12-27 US disclosed
US-11396603-B2 Liquid, hybrid UV/vis radiation curable resin compositions for additive fabrication COVESTRO (NETHERLANDS) B.V. (NL) 2022-07-26 US disclosed
EP-3953160-A1 METHODOLOGIES TO RAPIDLY CURE AND COAT PARTS PRODUCED BY ADDITIVE MANUFACTURING Azul 3D, Inc. (US) 2022-02-16 EP disclosed
EP-1303553-A2 RADIATION-CURABLE COMPOSITIONS AND CURED ARTICLES Suncolor Corporation (US) 2003-04-23 EP disclosed
WO-2002006371-A2 RADIATION-CURABLE COMPOSITIONS AND CURED ARTICLES SUNCOLOR CORPORATION (US) 2002-01-24 WO disclosed
CN-1299812-A Oximate light initiator CIBA SC HOLDING AG (CH) 2001-06-20 CN disclosed
US-5780199-A A COPOLYAMIC ACID FROM TETRACARBOXYLIC ACID DIANHYDRIDE, ORGANIC DIAMINE, FLUORINATED DIAMINE, FLUORINATED TETRACARBOXYLIC ACID DIANHYDRIDE, A PHOTOINITIATOR AND SENSITIZER; EXPOSURE TO FORM IMAGES, PATTERNING, CROSSLINKING INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1998-07-14 US disclosed
US-5464927-A Polyamic acid and polyimide from fluorinated reactant INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1995-11-07 US disclosed
US-5310625-A Improved wall angles INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-05-10 US disclosed
EP-0560530-A1 Process for forming negative tone images of polyimides for integrated circuit manufacture International Business Machines Corporation (US) 1993-09-15 EP disclosed
EP-0538683-A1 Polyamic acid and polyimide from fluorinated reactant International Business Machines Corporation (US) 1993-04-28 EP disclosed