⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL665762 | 0.77 | — | — | |
| SCHEMBL9516267 | 0.74 | — | — | |
| SCHEMBL28267165 | 0.71 | — | — | |
| SCHEMBL5867558 | 0.71 | — | — | |
| SCHEMBL30925357 | 0.69 | TSHR (0.53) | — | |
| Butane SCHEMBL21407957 | 0.67 | — | — | |
| SCHEMBL22974968 | 0.60 | — | — | |
| SCHEMBL8385848 | 0.59 | — | — | |
| SCHEMBL49670 | 0.59 | — | — | |
| SCHEMBL208611 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118324405-B | Method for producing aluminum silicate fiber cotton by utilizing solid-risk waste in cooperation with resource | 广西中玻新材料科技集团有限公司 | 2025-04-08 | — | — | CN | claimed |
| CN-118324405-A | Method for producing aluminum silicate fiber cotton by utilizing solid-risk waste in cooperation with resource | 广西中玻新材料科技集团有限公司 | 2024-07-12 | — | — | CN | claimed |
| CN-118324405-B | Method for producing aluminum silicate fiber cotton by utilizing solid-risk waste in cooperation with resource | 广西中玻新材料科技集团有限公司 | 2025-04-08 | — | — | CN | disclosed |
| CN-118324405-A | Method for producing aluminum silicate fiber cotton by utilizing solid-risk waste in cooperation with resource | 广西中玻新材料科技集团有限公司 | 2024-07-12 | — | — | CN | disclosed |
| CN-108368007-A | The method of production and purifying 2,3,3,3- tetrafluoro-1-propenes | 阿科玛法国公司 | 2018-08-03 | — | — | CN | disclosed |
| US-20170283443-A1 | FLUOROSILICON NITRILE COMPOUNDS | ARKEMA INC. | 2017-10-05 | — | — | US | disclosed |
| WO-2016032792-A1 | FLUOROSILICON NITRILE COMPOUNDS | ARKEMA INC. (US) | 2016-03-03 | — | — | WO | disclosed |
| US-20140230603-A1 | POWDER MIXTURE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-08-21 | — | — | US | disclosed |
| US-8791221-B2 | Addition-curable metallosiloxane compound | DAICEL CORPORATION (JP) | 2014-07-29 | — | — | US | disclosed |
| EP-2650319-A1 | ADDITION-CURABLE METALLOSILOXANE COMPOUND | Daicel Corporation (JP) | 2013-10-16 | — | — | EP | disclosed |
| US-20130267653-A1 | ADDITION-CURABLE METALLOSILOXANE COMPOUND | DAICEL CORPORATION (JP) | 2013-10-10 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| EP-0632811-A1 | PRODUCTION OF TRIFLUOROVINYL ETHERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-01-11 | — | — | EP | disclosed |
| WO-1993020085-A1 | PRODUCTION OF TRIFLUOROVINYL ETHERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-10-14 | — | — | WO | disclosed |