SCHEMBL705350

SCHEMBL705350

CCCC[SiH](F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methylamine SCHEMBL3101711 0.94
SCHEMBL9767480 0.90
SCHEMBL9989016 0.87 TSHR (0.50)
SCHEMBL15091720 0.87 TSHR (0.50)
SCHEMBL9989758 0.87 TSHR (0.50)
SCHEMBL9989021 0.87 TSHR (0.50)
SCHEMBL9989753 0.87 TSHR (0.50)
SCHEMBL15303910 0.79 TSHR (0.40)
SCHEMBL706176 0.77
SCHEMBL23701288 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024061483-A1 NOVEL MINIGASTRIN-DERIVED CHOLECYSTOKININ 2 RECEPTOR BINDING MOLECULES FOR IMAGING AND TARGETED RADIOTHERAPY Technische Universität München (DE) 2024-03-28 WO disclosed
WO-2024023332-A1 SILICON-BASED FLUORIDE ACCEPTOR GROUPS FOR RADIOPHARMACEUTICALS Technische Universität München (DE) 2024-02-01 WO disclosed
EP-3917581-A1 SILICON-FLUORIDE ACCEPTOR SUBSTITUTED RADIOPHARMACEUTICALS AND PRECURSORS THEREOF Technische Universität München (DE) 2021-12-08 EP disclosed
WO-2020157128-A1 SILICON-FLUORIDE ACCEPTOR SUBSTITUTED RADIOPHARMACEUTICALS AND PRECURSORS THEREOF Technische Universität München (DE) 2020-08-06 WO disclosed
US-8791221-B2 Addition-curable metallosiloxane compound DAICEL CORPORATION (JP) 2014-07-29 US disclosed
EP-2661284-A1 HER2 BINDING PEPTIDES LABELLED WITH A 18F - CONTAINING ORGANOSILICON COMPOUND GE Healthcare UK Limited (GB) 2013-11-13 EP disclosed
EP-2654804-A1 HER2 BINDING PEPTIDES LABELED WITH ALUMINIUM-[18]FLUORIDE COMPLEXED BY NOTA GE Healthcare UK Limited (GB) 2013-10-30 EP disclosed
EP-2650319-A1 ADDITION-CURABLE METALLOSILOXANE COMPOUND Daicel Corporation (JP) 2013-10-16 EP disclosed
US-20130267653-A1 ADDITION-CURABLE METALLOSILOXANE COMPOUND DAICEL CORPORATION (JP) 2013-10-10 US disclosed
WO-2012087908-A1 HER2 BINDING PEPTIDES LABELED WITH ALUMINIUM-[18] FLUORIDE COMPLEXED BY NOTA GE HEALTHCARE LIMITED (GB) 2012-06-28 WO disclosed
WO-2012087912-A1 HER2 BINDING PEPTIDES LABELLED WITH A 18F - CONTAINING ORGANOSILICON COMPOUND GE HEALTHCARE LIMITED (GB) 2012-06-28 WO disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed