⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1224965 | 0.79 | — | — | |
| SCHEMBL1225349 | 0.76 | — | — | |
| SCHEMBL706965 | 0.76 | — | — | |
| SCHEMBL706502 | 0.73 | — | — | |
| SCHEMBL703060 | 0.64 | — | — | |
| SCHEMBL3915910 | 0.50 | — | — | |
| SCHEMBL25406760 | 0.39 | — | — | |
| SCHEMBL37498 | 0.39 | — | — | |
| SCHEMBL1030445 | 0.39 | — | — | |
| SCHEMBL134582 | 0.39 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8426505-B2 | Resin composition for laser engraving, relief printing starting plate for laser engraving, process for making relief printing plate, and relief printing plate | FUJIFILM CORPORATION (JP) | 2013-04-23 | — | — | US | disclosed |
| EP-2554393-A1 | LASER-ENGRAVABLE FLEXOGRAPHIC PRINTING PLATE PRECURSOR | FUJIFILM Corporation (JP) | 2013-02-06 | — | — | EP | disclosed |
| US-20130020739-A1 | FLEXOGRAPHIC PRINTING PLATE PRECURSOR FOR LASER ENGRAVING | FUJIFILM CORPORATION (JP) | 2013-01-24 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20110156317-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING STARTING PLATE FOR LASER ENGRAVING, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2011-06-30 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |