SCHEMBL7060937

SCHEMBL7060937

FC(C(F)(F)F)C(F)(F)CC(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22624216 0.77
SCHEMBL6851325 0.77
SCHEMBL17920795 0.77
SCHEMBL649559 0.75
SCHEMBL15403569 0.75
SCHEMBL332819 0.73
SCHEMBL7524263 0.73
SCHEMBL15403493 0.73
SCHEMBL332995 0.71
SCHEMBL15404445 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230084014-A1 SOFT WATER- AND OIL-REPELLENT COMPRISING FLUORINE-CONTAINING POLYMER AS ACTIVE INGREDIENT UNIMATEC CO., LTD. (JP) 2023-03-16 US disclosed
US-11574821-B2 Substrate treating method, substrate treating liquid and substrate treating apparatus SCREEN Holdings Co., Ltd. 2023-02-07 US disclosed
EP-4105249-A1 SOFT WATER- AND OIL-REPELLENT INCLUDING FLUORINE-CONTAINING POLYMER AS ACTIVE INGREDIENT Unimatec Co., Ltd. (JP) 2022-12-21 EP disclosed
CN-109309032-B Substrate processing method and substrate processing apparatus 株式会社斯库林集团 2022-07-15 CN disclosed
US-20220189762-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2022-06-16 US disclosed
US-11302525-B2 Substrate processing method and substrate processing apparatus SCREEN Holdings Co., Ltd. 2022-04-12 US disclosed
US-8987397-B2 Fluorine-containing copolymer UNIMATEC CO., LTD. (JP) 2015-03-24 US disclosed
US-20130172502-A1 FLUORINE-CONTAINING COPOLYMER UNIMATEC CO., LTD. (JP) 2013-07-04 US disclosed
EP-0688860-B1 PROCESS FOR PRODUCING CLEAN ARTICLE DAIKIN IND LTD (JP) 2003-05-21 EP disclosed
US-5824634-A USEFUL IN THE ELECTRONIC INDUSTRY E. I. DU PONT DE NEMOURS AND COMPANY (US) 1998-10-20 US disclosed
EP-0610507-B1 CLEANING SOLVENT COMPOSITION AND CLEANING METHOD DAIKIN IND LTD (JP) 1998-07-01 EP disclosed
US-5531916-A 1,1,1,3,4,4,5,5,5-NONAFLUORO-2-TRIFLUOROMETHYLPENTANE MIXED WITH METHANOL OR ETHANOL COSOLVENT E. I. DU PONT DE NEMOURS AND COMPANY (US) 1996-07-02 US disclosed
EP-0688860-A1 PROCESS FOR PRODUCING CLEAN ARTICLE DAIKIN INDUSTRIES, LIMITED (JP) 1995-12-27 EP disclosed
EP-0610507-A1 CLEANING SOLVENT COMPOSITION AND CLEANING METHOD DAIKIN INDUSTRIES, LTD. (JP) 1994-08-17 EP disclosed