⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL704724 | 0.82 | — | — | |
| SCHEMBL719935 | 0.82 | — | — | |
| SCHEMBL3397742 | 0.82 | — | — | |
| Water SCHEMBL27557056 | 0.79 | — | — | |
| SCHEMBL49670 | 0.78 | — | — | |
| SCHEMBL16784959 | 0.76 | — | — | |
| SCHEMBL7574772 | 0.76 | — | — | |
| SCHEMBL3397133 | 0.76 | — | — | |
| SCHEMBL6885951 | 0.76 | — | — | |
| Propane SCHEMBL23701103 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108404893-A | A kind of silica gel chromatographic column filling material, preparation method and applications | 浙江月旭材料科技有限公司 | 2018-08-17 | — | — | CN | claimed |
| CN-108176387-A | A kind of silica gel chromatographic column filling material, preparation method and applications | 浙江月旭材料科技有限公司 | 2018-06-19 | — | — | CN | claimed |
| CN-108404893-A | A kind of silica gel chromatographic column filling material, preparation method and applications | 浙江月旭材料科技有限公司 | 2018-08-17 | — | — | CN | disclosed |
| CN-108176387-A | A kind of silica gel chromatographic column filling material, preparation method and applications | 浙江月旭材料科技有限公司 | 2018-06-19 | — | — | CN | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| US-5744196-A | Low temperature deposition of silicon dioxide using organosilanes | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1998-04-28 | — | — | US | disclosed |
| EP-0721019-A2 | Low temperature deposition of silicon dioxide using organosilanes | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1996-07-10 | — | — | EP | disclosed |