SCHEMBL706392

SCHEMBL706392

CC[Si](OC(C)C)(OC(C)C)c1ccccc1

nearest known ligand 0.33

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.32
LMNA P02545 3/20 0.31
ALDH1A1 P00352 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
TP53 P04637 1/20 0.31
SIGMAR1 Q99720 2/20 0.31
TAAR1 Q96RJ0 4/20 0.30
SLC6A2 P23975 2/20 0.30
MAOA P21397 1/20 0.30
SLC6A4 P31645 1/20 0.30
SLC6A3 Q01959 1/20 0.30
ESR1 P03372 1/20 0.30
CYP2A6 P11509 1/20 0.30
ADORA2A P29274 1/20 0.30
ADORA1 P30542 1/20 0.30
HTT P42858 1/20 0.30
PRNP P04156 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704256 0.89 ESR1 (0.38) ESR1
SCHEMBL704437 0.85 TSHR (0.33) TSHRLMNAALDH1A1L3MBTL1SIGMAR1
SCHEMBL703426 0.85 TSHR (0.33) TSHRLMNAALDH1A1L3MBTL1SIGMAR1
SCHEMBL705467 0.84 TSHR (0.31) TSHRSIGMAR1ESR1
SCHEMBL4270393 0.84 MAPT (0.33) TSHRLMNA
SCHEMBL13089476 0.82
SCHEMBL28620078 0.82 MEN1 (0.40) LMNAALDH1A1L3MBTL1ESR1HTT
SCHEMBL703879 0.82 TSHR (0.32) TSHRLMNAALDH1A1L3MBTL1
SCHEMBL4078011 0.82 TSHR (0.32) TSHRLMNAALDH1A1L3MBTL1
SCHEMBL707187 0.82 TSHR (0.32) TSHRLMNAALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103492499-A Silica-coating-forming composition for use with inkjets, method for forming silica coating, semiconductor device, and solar-cell system HITACHI CHEMICAL CO LTD 2014-01-01 CN disclosed
CN-101639628-B Radioactive linear composition for forming of coloring layer, color filter and color liquid crystal display element JSR CORP JP 2013-04-03 CN disclosed
CN-101646718-B Curable resin composition, protective film, and method for forming protective film JSR CORP JP 2013-04-03 CN disclosed
CN-101226329-B Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof JSR CORP 2012-09-05 CN disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100261925-A1 METHOD FOR PRODUCING SILICON COMPOUND JSR CORPORATION (JP) 2010-10-14 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
CN-101646718-A The formation method of curable resin composition, protective membrane and protective membrane JSR CORP JP 2010-02-10 CN disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
CN-101639628-A Radioactive linear composition for forming of coloring layer, color filter and color liquid crystal display element JSR CORP JP 2010-02-03 CN disclosed
US-7604866-B2 Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance ASAHI KASEI KABUSHIKI KAISHA (JP) 2009-10-20 US disclosed
CN-101226329-A Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof JSR CORP (JP) 2008-07-23 CN disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
US-20060269724-A1 Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance ASAHI KASEI KABUSHIKI KAISHA (JP) 2006-11-30 US disclosed
US-20040077757-A1 Coating composition for use in producing an insulating thin film ASAHI KASEI KABUSHIKI KAISHA (JP) 2004-04-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100261925-A1 METHOD FOR PRODUCING SILICON COMPOUND GMNN, GEMIN5, SEPTIN7 TSHR 4191/4885LMNA 4134/4885ALDH1A1 3835/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.