Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13370698 | 0.91 | — | — | |
| SCHEMBL13346238 | 0.87 | — | — | |
| SCHEMBL13346253 | 0.87 | — | — | |
| SCHEMBL13346248 | 0.86 | — | — | |
| SCHEMBL13370541 | 0.84 | — | — | |
| SCHEMBL13346256 | 0.84 | — | — | |
| SCHEMBL13346257 | 0.80 | — | — | |
| SCHEMBL13346258 | 0.75 | — | — | |
| SCHEMBL13197289 | 0.75 | SLC6A2 (0.31) | — | |
| SCHEMBL14117759 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240329525-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-10-03 | — | — | US | disclosed |
| US-20240210827-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-06-27 | — | — | US | disclosed |
| CN-113820920-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2023-07-04 | — | — | CN | disclosed |
| CN-110088680-B | Double-layer photosensitive layer roll | 旭化成株式会社 | 2022-12-30 | — | — | CN | disclosed |
| CN-115185157-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2022-10-14 | — | — | CN | disclosed |
| US-10990008-B2 | Resin composition | TORAY INDUSTRIES, INC. (JP) | 2021-04-27 | — | — | US | disclosed |
| US-10907010-B2 | Metathesis polymerization methods | UNIVERSITY OF WASHINGTON (US) | 2021-02-02 | — | — | US | disclosed |
| EP-3356445-B1 | POLYURETHANE ADHESIVE LAYERS FOR ELECTRO-OPTIC ASSEMBLIES | E INK CORP (US) | 2021-01-06 | — | — | EP | disclosed |
| US-20200409263-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-12-31 | — | — | US | disclosed |
| US-10831101-B2 | Photosensitive resin composition, method for manufacturing cured relief pattern, and semiconductor apparatus | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-11-10 | — | — | US | disclosed |
| EP-1734061-B1 | Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer and uses thereof | MITSUI CHEMICALS INC (JP) | 2010-04-07 | — | — | EP | disclosed |
| US-20090137757-A1 | Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof | IMUTA JUNICHI | 2009-05-28 | — | — | US | disclosed |
| US-20090137757-A1 | Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof | IMUTA JUNICHI | 2009-05-28 | — | — | US | disclosed |
| US-7393907-B2 | Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof | MITSUI CHEMICALS, INC. (JP) | 2008-07-01 | — | — | US | disclosed |
| US-7393907-B2 | Polar group-containing olefin copolymer, process for preparing the same, thermoplastic resin composition containing the copolymer, and uses thereof | MITSUI CHEMICALS, INC. (JP) | 2008-07-01 | — | — | US | disclosed |
| EP-0891988-B1 | Components and catalysts for the polymerization of olefins | BASELL POLIOLEFINE SPA (IT) | 2003-06-04 | — | — | EP | disclosed |
| EP-0451645-B1 | Components and catalysts for the polymerization of olefins | MONTELL NORTH AMERICA INC (US) | 1999-05-12 | — | — | EP | disclosed |
| EP-0891988-A2 | Components and catalysts for the polymerization of olefins | MONTELL NORTH AMERICA INC. (US) | 1999-01-20 | — | — | EP | disclosed |
| US-5068213-A | COMPONENTS AND CATALYSTS FOR THE POLYMERIZATION OF OLEFINS | HINMONT INCORPORATED (US) | 1991-11-26 | — | — | US | disclosed |
| EP-0451645-A2 | Components and catalysts for the polymerization of olefins | MONTELL NORTH AMERICA INC. (US) | 1991-10-16 | — | — | EP | disclosed |