⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10421518 | 0.87 | — | — | |
| SCHEMBL1087131 | 0.87 | — | — | |
| SCHEMBL745540 | 0.87 | — | — | |
| SCHEMBL78411 | 0.87 | — | — | |
| SCHEMBL271315 | 0.75 | — | — | |
| SCHEMBL2932486 | 0.75 | — | — | |
| SCHEMBL2772735 | 0.75 | — | — | |
| SCHEMBL9318497 | 0.75 | — | — | |
| SCHEMBL9566452 | 0.75 | — | — | |
| SCHEMBL11339261 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1109060-B1 | Silver halide photographic element | EASTMAN KODAK CO (US) | 2003-06-04 | — | — | EP | disclosed |
| EP-0843209-B1 | Silver halide emulsion manufacturing method | EASTMAN KODAK CO (US) | 2001-09-05 | — | — | EP | disclosed |
| EP-1109060-A2 | Silver halide photographic element | EASTMAN KODAK COMPANY (US) | 2001-06-20 | — | — | EP | disclosed |
| EP-0793139-B1 | Photographic materials with improved image tone | EASTMAN KODAK CO (US) | 2001-04-11 | — | — | EP | disclosed |
| US-6030763-A | REDUCTION-SENSITIZING A SILVER HALIDE BASIS GRAIN HAVING A SILVER BROMIDE CONTENT OF 75 MOL % OR MORE, DEPOSITING SILVER HALIDE HAVING SILVER CHLORIDE CONTENT OF 50 MOL % OR MORE ON THE SURFACE OF BASIS GRAIN FREE OF A DISTINCT EPITAXIAL | FUJI PHOTO FILM CO., LTD. (JP) | 2000-02-29 | — | — | US | disclosed |
| US-5985534-A | SILVER HALIDE EMULSIONS WITH TABULAR GRAINS AND SILVER IODIDE | FUJI PHOTO FILM CO., LTD. (JP) | 1999-11-16 | — | — | US | disclosed |
| US-5976779-A | CONTAINING A METHINE DYE | FUJI PHOTO FILM CO., LTD. (JP) | 1999-11-02 | — | — | US | disclosed |
| US-5972589-A | REDUCING THE SENSITIZATION IS PERFORMED BETWEEN CRYSTALLIZATION STEP AND WASHING STEP WITH A SULFURING AGENT AND A STABILIZER | IMATION CORPORATION (US) | 1999-10-26 | — | — | US | disclosed |
| US-5942383-A | AT LEAST ONE LAYER HAVING REDUCTION-SENSITIZED GRAINS AND ONE CONTAINING A SULFOALKENYL-CONTAINING CYANINE DYE; ANTIFOGGING AGENTS; STORAGE STABILITY; HIGH SENSITIVITY; TRANSPARENT MAGNETIC RECORDING MEDIA | FUJI PHOTO FILM CO., LTD. (JP) | 1999-08-24 | — | — | US | disclosed |
| US-5851751-A | Photographic materials with improved image tone | IMATION CORP. (US) | 1998-12-22 | — | — | US | disclosed |
| EP-0083096-B1 | PRODUCTION OF URETHANE COMPOUNDS | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1987-02-25 | — | — | EP | disclosed |
| US-4639410-A | Silver halide color photographic light sensitive-material | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1987-01-27 | — | — | US | disclosed |
| EP-0209118-A2 | Silver halide photographic material | KONICA CORPORATION (JP) | 1987-01-21 | — | — | EP | disclosed |
| EP-0201033-A2 | A method for processing silver halide color photographic materials | KONICA CORPORATION (JP) | 1986-11-12 | — | — | EP | disclosed |
| US-4621149-A | PLATINUM GROUP METAL HALOGEN OR HALOGEN COMPOUND | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1986-11-04 | — | — | US | disclosed |
| US-4587056-A | CARBONYLATION, OXIDATION, CATALYST | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1986-05-06 | — | — | US | disclosed |
| EP-0173540-A2 | Color image forming method | KONICA CORPORATION (JP) | 1986-03-05 | — | — | EP | disclosed |
| EP-0161550-A1 | Process for producing an aliphatic isocyanate | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1985-11-21 | — | — | EP | disclosed |
| EP-0135883-A2 | Silver halide photographic material | KONICA CORPORATION (JP) | 1985-04-03 | — | — | EP | disclosed |
| EP-0083096-A2 | Production of urethane compounds | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1983-07-06 | — | — | EP | disclosed |