SCHEMBL7065050

SCHEMBL7065050

O=[PH](CO)OCO.[NaH]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11417756 0.94
SCHEMBL29040609 0.73
SCHEMBL13850208 0.73
SCHEMBL1375572 0.69
SCHEMBL1375574 0.67
SCHEMBL27677584 0.66
SCHEMBL11032980 0.65
SCHEMBL28420589 0.65
SCHEMBL31350253 0.65
Ammonia Solution, Strong SCHEMBL28421662 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030225239-A1 Michael addition type urethane urea resin, production process therefor, adhesive, production process therefor, coating agent for forming ink receiving layer and recording material TOYO INK MANUFACTURING CO., LTD. (JP) 2003-12-04 US disclosed
EP-1146061-A1 MICHAEL ADDITION TYPE URETHANE-UREA RESIN, PROCESS FOR PRODUCING THE SAME, PRESSURE-SENSITIVE ADHESIVE, PROCESS FOR PRODUCING THE SAME, COATING MATERIAL FOR FORMING INK-RECEIVING LAYER, AND RECORDING MATERIAL Toyo Ink Manufacturing Co. Ltd. (JP) 2001-10-17 EP disclosed