SCHEMBL7070916

SCHEMBL7070916

C[AlH]C.[MgH2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19461001 0.89
Ammonia Solution, Strong SCHEMBL5201684 0.80
SCHEMBL20492032 0.80
SCHEMBL972572 0.55
SCHEMBL9023681 0.55
Ethane SCHEMBL4335189 0.52
Ethane SCHEMBL28464926 0.52
Ethane SCHEMBL30745849 0.52
SCHEMBL25310413 0.45
SCHEMBL158268 0.45

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0891366-B1 VOLATILE MAGNESIUM ALKYLALUMINUM ALKOXIDE AND DEPOSITION OF MAGNESIUM ALUMINATE FILM USING THE SAME KOREA RES INST CHEM TECH (KR) 2003-06-11 EP disclosed
EP-0891366-A1 VOLATILE MAGNESIUM ALKYLALUMINUM ALKOXIDE AND DEPOSITION OF MAGNESIUM ALUMINATE FILM USING SAME Korea Research Institute of Chemical Technology (KR) 1999-01-20 EP disclosed
WO-1997029112-A1 VOLATILE MAGNESIUM ALKYLALUMINUM ALKOXIDE AND DEPOSITION OF MAGNESIUM ALUMINATE FILM USING SAME KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) 1997-08-14 WO disclosed