⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL705593 | 0.84 | — | — | |
| SCHEMBL15091899 | 0.81 | — | — | |
| SCHEMBL15967927 | 0.76 | — | — | |
| SCHEMBL15092042 | 0.67 | — | — | |
| SCHEMBL31007150 | 0.53 | — | — | |
| SCHEMBL29241332 | 0.50 | — | — | |
| SCHEMBL7711925 | 0.50 | — | — | |
| SCHEMBL7155638 | 0.50 | — | — | |
| SCHEMBL2163371 | 0.46 | — | — | |
| SCHEMBL14722063 | 0.45 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119481270-A | High-voltage electrolyte and application thereof in lithium-rich manganese-based positive electrode system | 苏州埃米特材料科技有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-119481270-A | High-voltage electrolyte and application thereof in lithium-rich manganese-based positive electrode system | 苏州埃米特材料科技有限公司 | 2025-02-18 | — | — | CN | disclosed |
| US-20240404833-A1 | ETCHING METHODS USING SILICON-CONTAINING HYDROFLUOROCARBONS | AIR LIQUIDE (FR) | 2024-12-05 | — | — | US | disclosed |
| EP-3352281-B1 | NON-AQUEOUS ELECTROLYTE SOLUTION AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY | ADEKA CORP (JP) | 2021-08-11 | — | — | EP | disclosed |
| US-10734684-B2 | Nonaqueous electrolyte solution and nonaqueous electrolyte secondary battery | ADEKA CORPORATION (JP) | 2020-08-04 | — | — | US | disclosed |
| US-20180226683-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROPLYTE SECONDARY BATTERY | ADKEA CORPORATION (JP) | 2018-08-09 | — | — | US | disclosed |
| EP-3352281-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY | Adeka Corporation (JP) | 2018-07-25 | — | — | EP | disclosed |
| EP-2779299-B1 | NONAQUEOUS ELECTROLYTE SOLUTION, AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY USING SAID ELECTROLYTE SOLUTION | ADEKA CORP (JP) | 2017-08-02 | — | — | EP | disclosed |
| EP-2642579-B1 | NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY | ADEKA CORP (JP) | 2017-07-26 | — | — | EP | disclosed |
| EP-2642580-B1 | NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY | ADEKA CORP (JP) | 2017-03-29 | — | — | EP | disclosed |
| EP-2642579-A1 | NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY | Adeka Corporation (JP) | 2013-09-25 | — | — | EP | disclosed |
| US-20130236777-A1 | NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY | ADEKA CORPORATION (JP) | 2013-09-12 | — | — | US | disclosed |
| US-20130177822-A1 | NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY | ADEKA CORPORATION (JP) | 2013-07-11 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| EP-0378430-B1 | Novel organosilicon compound and process for producing organosilicon compound | AGENCY IND SCIENCE TECHN (JP) | 1995-02-01 | — | — | EP | disclosed |
| US-5151538-A | ORGANOSILICON COMPOUND AND PROCESS FOR PRODUCING ORGANOSILICON COMPOUND | AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1992-09-29 | — | — | US | disclosed |
| EP-0378430-A1 | Novel organosilicon compound and process for producing organosilicon compound | DIRECTOR-GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1990-07-18 | — | — | EP | disclosed |