Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DPP4 | P27487 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | F2 | P00734 | 1/20 | 0.41 |
| ▸ | MTOR | P42345 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | GRM7 | Q14831 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | HTR2A | P28223 | 2/20 | 0.38 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | SRC | P12931 | 1/20 | 0.36 |
| ▸ | HRH1 | P35367 | 2/20 | 0.36 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.36 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.36 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.36 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.36 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4774509 | 0.75 | DPP4 (0.45) | DPP4TSHRF2MTORRAB9A | |
| SCHEMBL1690661 | 0.74 | DPP4 (0.39) | DPP4TSHRF2MTORRAB9A | |
| SCHEMBL1494253 | 0.73 | DPP4 (0.43) | DPP4TSHRF2MTORRAB9A | |
| SCHEMBL842216 | 0.73 | DPP4 (0.43) | DPP4TSHRF2MTORRAB9A | |
| SCHEMBL8381565 | 0.71 | DPP4 (0.41) | DPP4TSHRF2MTORRAB9A | |
| SCHEMBL434195 | 0.71 | SRC (0.42) | DPP4TSHRF2CYP2D6SRC | |
| SCHEMBL704608 | 0.71 | DPP4 (0.41) | DPP4TSHRF2MTORRAB9A | |
| SCHEMBL245489 | 0.71 | TSHR (0.48) | DPP4TSHRF2MTORRAB9A | |
| SCHEMBL1494256 | 0.71 | DPP4 (0.48) | DPP4TSHRF2HTR2ATAAR1 | |
| SCHEMBL8386068 | 0.71 | DPP4 (0.41) | DPP4TSHRF2MTORRAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108376765-B | Lithium secondary battery including electrolyte containing monofluorosilane compound | 三星电子株式会社 | 2023-08-11 | — | — | CN | disclosed |
| CN-113982179-B | Heat-insulating environment-friendly baking-free brick and preparation method thereof | 宁乡宁华新材料有限公司 | 2023-03-17 | — | — | CN | disclosed |
| CN-110824040-B | Method for detecting fluorine ions based on chlorosilane derivatization | 杭州师范大学 | 2022-11-15 | — | — | CN | disclosed |
| US-11367902-B2 | Lithium secondary battery including electrolyte containing monofluorosilane compound | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2022-06-21 | — | — | US | disclosed |
| CN-113982179-A | Heat-insulating environment-friendly baking-free brick and preparation method thereof | 宁乡宁华新材料有限公司 | 2022-01-28 | — | — | CN | disclosed |
| US-20200119402-A1 | LITHIUM SECONDARY BATTERY INCLUDING ELECTROLYTE CONTAINING MONOFLUOROSILANE COMPOUND | SAMSUNG ELECTRONICS CO LTD (KR) | 2020-04-16 | — | — | US | disclosed |
| EP-3355390-B1 | LITHIUM SECONDARY BATTERY INCLUDING ELECTROLYTE CONTAINING MONOFLUOROSILANE COMPOUND | SAMSUNG ELECTRONICS CO LTD (KR) | 2020-02-12 | — | — | EP | disclosed |
| US-10547085-B2 | Lithium secondary battery including electrolyte containing monofluorosilane compound | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2020-01-28 | — | — | US | disclosed |
| US-20180219258-A1 | LITHIUM SECONDARY BATTERY INCLUDING ELECTROLYTE CONTAINING MONOFLUOROSILANE COMPOUND | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-08-02 | — | — | US | disclosed |
| EP-3355390-A1 | LITHIUM SECONDARY BATTERY INCLUDING ELECTROLYTE CONTAINING MONOFLUOROSILANE COMPOUND | Samsung Electronics Co., Ltd. (KR) | 2018-08-01 | — | — | EP | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20090088541-A1 | ALUMINOXANE COMPOSITIONS, THEIR PREPARATION, AND THEIR USE IN CATALYSIS | ALBEMARLE CORPORATION (US) | 2009-04-02 | — | — | US | disclosed |
| US-7355058-B2 | Haloaluminoxane compositions, their preparation, and their use in catalysis | ALBEMARLE CORPORATION (US) | 2008-04-08 | — | — | US | disclosed |
| US-7193100-B2 | Haloaluminoxane compositions, their preparation, and their use in catalysis | ALBEMARLE CORPORATION (US) | 2007-03-20 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| WO-2007005364-A2 | HALOALUMINOXANE COMPOSITIONS | ALBEMARLE CORPORATION (US) | 2007-01-11 | — | — | WO | disclosed |
| US-20060287448-A1 | Haloaluminoxane compositions, their preparation, and their use in catalysis | W. R. GRACE & CO-CONN. | 2006-12-21 | — | — | US | disclosed |
| EP-1701963-A1 | HALOALUMINOXANE COMPOSITIONS, THEIR PREPARATION, AND THEIR USE IN CATALYSIS | ALBEMARLE CORPORATION (US) | 2006-09-20 | — | — | EP | disclosed |
| WO-2005066191-A1 | HALOALUMINOXANE COMPOSITIONS, THEIR PREPARATION, AND THEIR USE IN CATALYSIS | ALBEMARLE CORPORATION (US) | 2005-07-21 | — | — | WO | disclosed |
| US-20050143254-A1 | Haloaluminoxane compositions, their preparation, and their use in catalysis | W. R. GRACE & CO.-CONN. | 2005-06-30 | — | — | US | disclosed |