⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28253262 | 0.90 | — | — | |
| SCHEMBL17138340 | 0.87 | TSHR (0.50) | — | |
| SCHEMBL17138333 | 0.87 | TSHR (0.50) | — | |
| SCHEMBL17138301 | 0.87 | TSHR (0.50) | — | |
| SCHEMBL6896907 | 0.79 | TSHR (0.40) | — | |
| SCHEMBL704635 | 0.77 | — | — | |
| SCHEMBL23701238 | 0.76 | — | — | |
| SCHEMBL21383006 | 0.74 | — | — | |
| SCHEMBL23701305 | 0.73 | — | — | |
| SCHEMBL23701097 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024211411-A1 | PERFORMING ATOMIC LAYER ETCHING USING A SILANE-BASED CHEMISTRY | LAM RESEARCH CORPORATION (US) | 2024-10-10 | — | — | WO | claimed |
| US-6005012-A | DEHALOGENATION OF ORGANOMETALLIC HALIDES | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 1999-12-21 | — | — | US | claimed |
| US-5958363-A | Method for making monolithic metal oxide aerogels | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 1999-09-28 | — | — | US | claimed |
| WO-2024211411-A1 | PERFORMING ATOMIC LAYER ETCHING USING A SILANE-BASED CHEMISTRY | LAM RESEARCH CORPORATION (US) | 2024-10-10 | — | — | WO | disclosed |
| US-11512002-B2 | Silica materials and methods of making thereof | UNIVERSITY OF VIRGINIA PATENT FOUNDATION (US) | 2022-11-29 | — | — | US | disclosed |
| CN-104974184-B | preparation of silazane Compounds | 信越化学工业株式会社 | 2019-12-06 | — | — | CN | disclosed |
| US-20190322535-A1 | Silica Materials and Methods of Making Thereof | UNIVERSITY OF VIRGINIA PATENT FOUNDATION | 2019-10-24 | — | — | US | disclosed |
| US-9970103-B2 | Film deposition material, sealing film using the same and use thereof | TOSOH CORPORATION (JP) | 2018-05-15 | — | — | US | disclosed |
| EP-2930177-B1 | PREPARATION OF SILAZANE COMPOUND | SHINETSU CHEMICAL CO (JP) | 2018-04-25 | — | — | EP | disclosed |
| US-20160326642-A1 | FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF | TOSOH CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |
| US-9416147-B2 | Preparation of silazane compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-16 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| EP-1098926-B1 | CROSS-LINKABLE HYPERBRANCHED POLYMERS, METHOD FOR THE PRODUCTION AND USE OF THE SAME | BAYER MATERIALSCIENCE AG (DE) | 2004-03-03 | — | — | EP | disclosed |
| EP-1098926-A1 | CROSS-LINKABLE HYPERBRANCHED POLYMERS, METHOD FOR THE PRODUCTION AND USE OF THE SAME | Bayer Aktiengesellschaft (DE) | 2001-05-16 | — | — | EP | disclosed |
| WO-2000002954-A1 | CROSS-LINKABLE HYPERBRANCHED POLYMERS, METHOD FOR THE PRODUCTION AND USE OF THE SAME | BAYER AKTIENGESELLSCHAFT (DE) | 2000-01-20 | — | — | WO | disclosed |
| US-6005012-A | DEHALOGENATION OF ORGANOMETALLIC HALIDES | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 1999-12-21 | — | — | US | disclosed |
| US-5958363-A | Method for making monolithic metal oxide aerogels | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 1999-09-28 | — | — | US | disclosed |