SCHEMBL708084

SCHEMBL708084

CC(=O)CC(C)=O.CC(=O)CC(C)=O.[Ti]

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MGAM O43451 1/20 0.53
GAA P10253 1/20 0.53
SI P14410 1/20 0.53
MGAM2 Q2M2H8 1/20 0.53
ALDH1A1 P00352 5/20 0.50
TDP1 Q9NUW8 2/20 0.50
HTT P42858 2/20 0.47
TRPA1 O75762 1/20 0.47
KDM4E B2RXH2 3/20 0.45
KDM6B O15054 1/20 0.45
KDM5C P41229 1/20 0.45
EGLN1 Q9GZT9 1/20 0.45
PHF8 Q9UPP1 1/20 0.45
KDM2A Q9Y2K7 1/20 0.45
LMNA P02545 4/20 0.42
CA2 P00918 1/20 0.40
PTGS1 P23219 1/20 0.40
MMP12 P39900 1/20 0.40
SLC15A2 Q16348 1/20 0.39
TSHR P16473 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27811041 1.00
SCHEMBL28262110 1.00 MGAM (0.53) MGAMGAASIMGAM2ALDH1A1
SCHEMBL28428733 1.00 MGAM (0.53) MGAMGAASIMGAM2ALDH1A1
SCHEMBL165703 1.00
SCHEMBL11690629 1.00 MGAM (0.53) MGAMGAASIMGAM2ALDH1A1
Water SCHEMBL28189125 0.96 MGAM (0.50) MGAMGAASIMGAM2ALDH1A1
SCHEMBL27474962 0.96
SCHEMBL29291618 0.96
SCHEMBL28097117 0.96
SCHEMBL28256028 0.96

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119731595-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device 富士胶片株式会社 2025-03-28 CN claimed
CN-112812733-A Low-modulus high-elongation transparent pouring sealant composition and preparation method thereof 广州市白云化工实业有限公司 2021-05-18 CN claimed
CN-106970059-B Preparation and application of two-photon fluorescent probe 上海健康医学院 2020-06-16 CN claimed
CN-106675111-A Acrylate-modified calcium carbonate filler capable of improving machinability and preparation method thereof 安徽九子山塑业有限公司 2017-05-17 CN claimed
US-5905109-A HYDROLYSIS AND CONDENSATION TO FORM POLYMERS WITH CATALYSTS JSR CORPORATION (JP) 1999-05-18 US claimed
CN-120077104-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device 富士胶片株式会社 2025-05-30 CN disclosed
CN-116648313-B Resin composition, cured product, laminate, method for producing cured product, and semiconductor device 富士胶片株式会社 2025-05-16 CN disclosed
CN-119998728-A Film manufacturing method, photosensitive resin composition, cured product manufacturing method, cured product, and laminate 富士胶片株式会社 2025-05-13 CN disclosed
CN-114730132-B Curable resin composition, cured film, laminate, method for producing cured film, semiconductor device, and resin 富士胶片株式会社 2025-05-09 CN disclosed
CN-119968421-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device 富士胶片株式会社 2025-05-09 CN disclosed
CN-119731595-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device 富士胶片株式会社 2025-03-28 CN disclosed
CN-119731225-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device 富士胶片株式会社 2025-03-28 CN disclosed
US-6335061-B1 FORMING ON SURFACE OF AN ORGANIC FILM AN (UNDER)COATING OF A COATING COMPOSED OF ORGANOSILANES, HYDROLYZATES OF THE ORGANOSILANES, AND CONDENSATES OF THE ORGANOSILANES AND, WHEN DESIRED, A POLYMER COMPONENT HAVING SILYL GROUPS JSR CORPORATION (JP) 2002-01-01 US disclosed
US-6280896-B1 MULTILAYER ELEMENT WITH SUPPORT AND SURFACE PROTECTANT WITH FLUORINE CONTAINING POLYSILOXANE MINOLTA CO., LTD. (JP) 2001-08-28 US disclosed
US-20010008738-A1 Photosensitive member for electrophotography MINOLTA CO., LTD. 2001-07-19 US disclosed
EP-1106661-A2 Coating composition and hardened film obtained therefrom JSR Corporation (JP) 2001-06-13 EP disclosed
EP-1022319-A2 Method of making coating layers containing photocatalyst and a photocatalyst coating glass formed thereby JSR Corporation (JP) 2000-07-26 EP disclosed
EP-1022318-A2 Method of making coating layers containing photocatalyst and a photocatalyst coating film formed thereby JSR Corporation (JP) 2000-07-26 EP disclosed
US-6071226-A BALANCE BETWEEN POT LIFE AND REACTIVITY IN CURING, ANTICORROSIVE PROPERTIES AND NONYELLOWING DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2000-06-06 US disclosed
CN-1111216-A Heat ray-reflecting glass NIPPON SHEET GLASS CO LTD (JP) 1995-11-08 CN disclosed