SCHEMBL7083240

SCHEMBL7083240

CC(=O)OCC(O)COc1ccc(Cc2ccc(OCC(O)COC(C)=O)cc2)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.58
POLB P06746 2/20 0.58
MAPT P10636 2/20 0.58
NPSR1 Q6W5P4 1/20 0.58
SMN1; SMN2 Q16637 1/20 0.53
CYP1A2 P05177 3/20 0.51
ADRB2 P07550 3/20 0.45
ADRB1 P08588 3/20 0.45
TDP1 Q9NUW8 2/20 0.45
TSHR P16473 2/20 0.45
CNR1 P21554 1/20 0.45
ADRA1D P25100 1/20 0.45
ADRA1A P35348 1/20 0.45
ADRA1B P35368 1/20 0.45
KDM4E B2RXH2 1/20 0.45
GLA P06280 1/20 0.45
CYP3A4 P08684 1/20 0.45
NFKB1 P19838 1/20 0.45
THPO P40225 1/20 0.45
BLM P54132 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7082811 0.92 MAPT (0.68) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL7090368 0.87 MAPT (0.62) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL18382506 0.85 POLB (0.60) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL3194809 0.85 POLB (0.53) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL7088132 0.84 MAPT (0.58) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL7084425 0.84 MAPT (0.58) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL6351413 0.83 MAPT (0.57) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL19484559 0.83 AR (0.54) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL13793485 0.83 MAPT (0.57) LMNAPOLBMAPTNPSR1SMN1; SMN2
SCHEMBL7082985 0.82 POLB (0.56) LMNAPOLBMAPTNPSR1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030149219-A1 Process for manufacturing a hydroxyester derivative intermediate and epoxy resins prepared therefrom BORIACK CLINTON J (US) 2003-08-07 US claimed
US-6534621-B2 Epoxidizing an alpha-halohydrin intermediate produced from an in situ halide substitution-deesterification of an alpha-hydroxy ester derivative DOW GLOBAL TECHNOLOGIES INC. 2003-03-18 US claimed
US-20020045707-A1 Process for manufacturing a hydroxyester derivative intermediate and epoxy resins prepared therefrom DOW GLOBAL TECHNOLOGIES INC. 2002-04-18 US claimed
US-20030149219-A1 Process for manufacturing a hydroxyester derivative intermediate and epoxy resins prepared therefrom BORIACK CLINTON J (US) 2003-08-07 US disclosed
US-6534621-B2 Epoxidizing an alpha-halohydrin intermediate produced from an in situ halide substitution-deesterification of an alpha-hydroxy ester derivative DOW GLOBAL TECHNOLOGIES INC. 2003-03-18 US disclosed
US-20020045707-A1 Process for manufacturing a hydroxyester derivative intermediate and epoxy resins prepared therefrom DOW GLOBAL TECHNOLOGIES INC. 2002-04-18 US disclosed