SCHEMBL708989

SCHEMBL708989

C=CCN1CCNCC1N

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 1/20 0.31
CHRM3 P20309 1/20 0.31
HTR3A P46098 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL27874578 0.98 CHRM2 (0.31) CHRM2CHRM3HTR3A
Pyrrolidine SCHEMBL27776132 0.93 CHRM2 (0.34) CHRM2CHRM3HTR3A
Hydrochloric Acid SCHEMBL25313000 0.79
SCHEMBL27874575 0.79
SCHEMBL5694541 0.77 CHRM2 (0.31) CHRM2CHRM3
SCHEMBL13771787 0.77 MAPT (0.39) CHRM2CHRM3
SCHEMBL1414718 0.77 MAPT (0.33) CHRM2CHRM3
SCHEMBL10498523 0.77 DPP4 (0.32)
SCHEMBL3366367 0.76 CHRM2 (0.31) CHRM2CHRM3
SCHEMBL3861432 0.76 CHRM2 (0.31) CHRM2CHRM3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 315 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107075347-B Polishing composition 福吉米株式会社 2020-03-20 CN claimed
US-10190024-B2 Polishing composition FUJIMI INCORPORATED (JP) 2019-01-29 US claimed
EP-3211053-B1 POLISHING COMPOSITION FUJIMI INC (JP) 2018-12-19 EP claimed
US-9840588-B2 Epoxy resin curing compositions and epoxy resin systems including same HEXION INC. (US) 2017-12-12 US claimed
US-20170247574-A1 POLISHING COMPOSITION FUJIMI INCORPORATED (JP) 2017-08-31 US claimed
EP-3211053-A1 COMPOSITION FOR POLISHING Fujimi Incorporated (JP) 2017-08-30 EP claimed
CN-107075347-A Polishing composition 福吉米株式会社 2017-08-18 CN claimed
EP-1627259-B1 COMPOSITIONS SUITABLE FOR REMOVING PHOTORESIST, PHOTORESIST BYPRODUCTS AND ETCHING RESIDUE, AND USE THEREOF AIR PROD & CHEM (US) 2015-07-01 EP claimed
US-8796391-B2 Epoxy resin curing compositions and epoxy resin systems including same MOMENTIVE SPECIALTY CHEMICALS INC. (US) 2014-08-05 US claimed
EP-2421687-A1 METHOD OF MAKING CHEMICALLY RESISTANT MOULDS AND TOOLS Huntsman Advanced Materials (Switzerland) GmbH (CH) 2012-02-29 EP claimed
US-5962629-A BLEND OF EPOXY RESIN, POLYAMIDE CURING AGENT AND WATER SHELL OIL COMPANY (US) 1999-10-05 US claimed
EP-0647222-A1 N(HETERO)-ARYL-N(HETERO)-TETRALIN-ALKYL-PIPERAZINE HAVING SEROTONINERGIC, DOPAMINERGIC AND ADRENERGIC ACTIVITY PHARMACIA & UPJOHN S.p.A. (IT) 1995-04-12 EP claimed
US-5338568-A Adding a glycol; concrete crack sealing CAPPAR LTD. (CA) 1994-08-16 US claimed
WO-1994000441-A1 N(HETERO)-ARYL-N(HETERO)-TETRALIN-ALKYL-PIPERAZINE HAVING SEROTONINERGIC, DOPAMINERGIC AND ADRENERGIC ACTIVITY FARMITALIA CARLO ERBA S.R.L. (IT) 1994-01-06 WO claimed
EP-0378205-B1 Adhesion and paintability improvements in PVC plastisols at low bake temperatures SHELL OIL CO (US) 1993-12-22 EP claimed
EP-0224391-B1 EPOXY RESIN COMPOSITIONS MITSUI SEKIYU KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1991-09-04 EP claimed
EP-0190317-B1 INTERNAL MOLD RELEASE COMPOSITIONS, ACTIVE HYDROGEN-CONTAINING COMPOSITIONS CONTAINING THE INTERNAL MOLD RELEASE COMPOSITIONS AND A PROCESS FOR PREPARING MOLDED POLYURETHANE AND/OR POLYUREA AND LIKE POLYMERS THE DOW CHEMICAL COMPANY (US) 1990-10-31 EP claimed
EP-0381096-A2 Additive for two component epoxy resin compositions CAPPAR LIMITED (CA) 1990-08-08 EP claimed
US-4937343-A NEUROLEPTICS OR ANTIDEPRESSANTS TROPONWERKE GMBH & CO. KG (DE) 1990-06-26 US claimed
US-4585803-A TERTIARY AMINE, METAL SALT OF ORGANIC ACID THE DOW CHEMICAL COMPANY (US) 1986-04-29 US claimed