SCHEMBL7100645

SCHEMBL7100645

CC(N)C1(O)CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15756034 1.00
SCHEMBL1152703 1.00
SCHEMBL7676836 0.97 SLC6A4 (0.36)
SCHEMBL7108059 0.97 SLC6A4 (0.36)
Hydrochloric Acid SCHEMBL1372449 0.97 SLC6A4 (0.34)
Hydrochloric Acid SCHEMBL23909496 0.97 SLC6A4 (0.34)
SCHEMBL1152813 0.97 SLC6A4 (0.36)
Hydrochloric Acid SCHEMBL23909495 0.97 SLC6A4 (0.34)
SCHEMBL1661392 0.97 SLC6A4 (0.36)
Hydrochloric Acid SCHEMBL2856568 0.95 SLC6A4 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100436406-C Process for producing optically active bisamidoalcohol compound SUMITOMO CHEMICAL CO (JP) 2008-11-26 CN disclosed
CN-100408553-C Method for producing optically active cycloalkylidenebisoxazoline compound and intermediate of the same SUMITOMO CHEMICAL CO (JP) 2008-08-06 CN disclosed
CN-1898196-A Process for producing optically active cycloalkylidenebisoxazoline compound and intermediate of the compound SUMITOMO CHEMICAL CO (JP) 2007-01-17 CN disclosed
CN-1898193-A Method for producing optically active bisamidealcohol compound SUMITOMO CHEMICAL CO (JP) 2007-01-17 CN disclosed
CN-1231456-C Process for preparing optically active cyclopropyl carboxylic acid derivative SUMITOMO CHEMICAL CO (JP) 2005-12-14 CN disclosed
CN-1480448-A Process for preparing optically active cyclopropyl carboxylic acid derivative ס�ѻ�ѧ��ҵ��ʽ���� 2004-03-10 CN disclosed
CN-1134422-C Optically active bisoxazoline compounds, process for their preparation and their use ������������ʽ���� 2004-01-14 CN disclosed
EP-0942010-B1 Transition metal compounds, catalyst components and catalysts for olefin polymerization, and process for producing olefinic polymer SUMITOMO CHEMICAL CO (JP) 2003-06-18 EP disclosed
US-6500909-B2 CONTAINING NICKEL, PALLADIUM, RHODIUM, RUTHENIUM, OR COBALT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-12-31 US disclosed
US-6410741-B1 INSECTICIDES SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-06-25 US disclosed
US-20010027162-A1 Transition metal compound, catalyst component for olefin polymerization, catalyst for olefin polymerization, and process for producing olefinic polymer HIRAHATA WATARU (JP) 2001-10-04 US disclosed
US-6242377-B1 POLYMERIZATION IN PRESENCE OF BISOXAZOLINE WITH NICKEL, COBALT, PALLADIUM, RHODIUM, RUTHENIUM, ALUMINUM AND BORON COMPLEXES SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-06-05 US disclosed
US-6072081-A Optically active bisoxazoline compounds, production and use thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-06-06 US disclosed
EP-0942010-A1 Transition metal compounds, catalyst components and catalysts for olefin polymerization, and process for producing olefinic polymers SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-09-15 EP disclosed
CN-1210858-A Optically active bisoxazoline compounds, process for their preparation and their use SUMITOMO CHEMICAL CO (JP) 1999-03-17 CN disclosed