SCHEMBL7101140

SCHEMBL7101140

O=C(O)c1ccc2c3c(=O)[nH]c(=O)c=3c2c1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PARP1 P09874 4/20 0.51
CSNK2A1 P68400 4/20 0.46
CSNK2A2 P19784 1/20 0.46
CSNK2B P67870 1/20 0.46
KDM4E B2RXH2 6/20 0.46
ALDH1A1 P00352 1/20 0.46
THRB P10828 1/20 0.46
HPGD P15428 1/20 0.46
RECQL P46063 1/20 0.45
KIF11 P52732 1/20 0.43
GRIK1 P39086 1/20 0.42
GRIK2 Q13002 1/20 0.42
GRIK3 Q13003 1/20 0.42
SIRT2 Q8IXJ6 1/20 0.42
SIRT1 Q96EB6 1/20 0.42
TP53 P04637 1/20 0.41
TSHR P16473 1/20 0.41
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2459129 0.76 PARP1 (0.54) PARP1CSNK2A1CSNK2A2CSNK2BKDM4E
SCHEMBL29399562 0.74 TSHR (0.58) PARP1KDM4EALDH1A1THRBHPGD
SCHEMBL31279968 0.74 TSHR (0.58) PARP1KDM4EALDH1A1THRBHPGD
SCHEMBL17254441 0.74 TSHR (0.58) PARP1KDM4EALDH1A1THRBHPGD
SCHEMBL17327572 0.73 TTR (0.50) PARP1KDM4EALDH1A1THRBHPGD
SCHEMBL29153700 0.72 KDM4E (0.49) PARP1CSNK2A1CSNK2A2CSNK2BKDM4E
SCHEMBL23830045 0.71 PARP1 (0.68) PARP1CSNK2A1CSNK2A2CSNK2BKDM4E
SCHEMBL29620678 0.71 PARP1 (0.68) PARP1CSNK2A1CSNK2A2CSNK2BKDM4E
SCHEMBL69604 0.71 KDM4E (0.67) PARP1KDM4EALDH1A1THRBHPGD
SCHEMBL30844878 0.71 KDM4E (0.67) PARP1KDM4EALDH1A1THRBHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0893456-B1 Process for producing modified acrylic rubber NIPPON MEKTRON KK (JP) 2003-08-27 EP disclosed
US-6380318-B1 PEROXIDE CURABLE; SOLVENT-FREE NIPPON MEKTRON, LIMITED (JP) 2002-04-30 US disclosed
EP-0893456-A1 Process for producing modified acrylic rubber Nippon Mektron, Limited (JP) 1999-01-27 EP disclosed